SCHEMBL2305216

SCHEMBL2305216

C=Cc1ccccc1OC1C=CC=CO1

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1397149 0.76 PTGDR2 (0.38) ALDH1A1
SCHEMBL18696084 0.76 CA2 (0.38) ALDH1A1
SCHEMBL9231833 0.71 ALDH1A1 (0.37) ALDH1A1
SCHEMBL10447249 0.71 HRH1 (0.33)
SCHEMBL31318388 0.70 SLC6A2 (0.45)
SCHEMBL27456690 0.66 ALDH1A1 (0.34) ALDH1A1
SCHEMBL664369 0.66 ALDH1A1 (0.44) ALDH1A1
SCHEMBL1360804 0.65 ALDH1A1 (0.40) ALDH1A1
SCHEMBL30415589 0.65 ALDH1A1 (0.40) ALDH1A1
SCHEMBL297297 0.65 ALDH1A1 (0.48) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0494792-B1 Tetrahydropyranyloxystyrene homopolymer and method of manufacturing the same SHINETSU CHEMICAL CO (JP) 1996-12-04 EP claimed
EP-0494792-A1 Tetrahydropyranyloxystyrene homopolymer and method of manufacturing the same Shin-Etsu Chemical Co., Ltd. (JP) 1992-07-15 EP claimed
WO-2020008994-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN JSR株式会社 2020-01-09 WO disclosed
EP-1595182-B1 HALOGENATED OXIME DERIVATIVES AND THE USE THEREOF AS LATENT ACIDS BASF SE (DE) 2015-09-30 EP disclosed
EP-2349993-A1 SULFONIUM DERIVATIVES AND THE USE THEROF AS LATENT ACIDS BASF SE (DE) 2011-08-03 EP disclosed
WO-2010046240-A1 SULFONIUM DERIVATIVES AND THE USE THEROF AS LATENT ACIDS BASF SE (DE) 2010-04-29 WO disclosed
EP-1769286-A2 OXIME DERIVATIVES AND THE USE THEROF AS LATENT ACIDS Ciba Specialty Chemicals Holding Inc. (CH) 2007-04-04 EP disclosed
WO-2006008250-A2 OXIME DERIVATIVES AND THE USE THEROF AS LATENT ACIDS CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2006-01-26 WO disclosed
EP-0388813-A2 Pattern forming material and process for forming pattern using the same HITACHI, LTD. (JP) 1990-09-26 EP disclosed