SCHEMBL664369

SCHEMBL664369

C=Cc1ccccc1O[SiH3]

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.44
HPGD P15428 3/20 0.35
HTT P42858 1/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
TSHR P16473 2/20 0.35
MAPK1 P28482 1/20 0.35
HSD17B10 Q99714 1/20 0.35
KMT2A Q03164 3/20 0.33
LMNA P02545 2/20 0.33
MEN1 O00255 2/20 0.33
GAA P10253 1/20 0.33
CYP3A4 P08684 1/20 0.33
NFE2L2 Q16236 3/20 0.32
TRPA1 O75762 1/20 0.32
SRC P12931 1/20 0.31
HDAC8 Q9BY41 1/20 0.31
THRB P10828 1/20 0.31
BLM P54132 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
CA12 O43570 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27939628 0.80 ALDH1A1 (0.35) ALDH1A1NFE2L2
SCHEMBL297297 0.80 ALDH1A1 (0.48) ALDH1A1HPGDHTTSMN1; SMN2TSHR
SCHEMBL8940327 0.79 ALDH1A1 (0.52) ALDH1A1HPGDHTTSMN1; SMN2TSHR
SCHEMBL15711501 0.76 ALDH1A1 (0.44) ALDH1A1HPGDHTTSMN1; SMN2TSHR
SCHEMBL14909 0.76 NFE2L2 (0.55) ALDH1A1HPGDSMN1; SMN2TSHRHSD17B10
SCHEMBL2331789 0.76 ALDH1A1 (0.44) ALDH1A1HPGDHTTSMN1; SMN2TSHR
SCHEMBL29377009 0.76 NFE2L2 (0.55) ALDH1A1HPGDSMN1; SMN2TSHRHSD17B10
SCHEMBL14421024 0.76 ALDH1A1 (0.44) ALDH1A1HPGDHTTSMN1; SMN2TSHR
SCHEMBL28464748 0.76 ALDH1A1 (0.50) ALDH1A1HPGDHTTSMN1; SMN2TSHR
SCHEMBL27087666 0.76 ALDH1A1 (0.61) ALDH1A1HPGDHTTSMN1; SMN2TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116041596-B Star polar polymer and preparation method thereof 辽宁科之镁新材料研究有限公司 2024-04-26 CN claimed
CN-116041596-A Star polar polymer and preparation method thereof 辽宁科之镁新材料研究有限公司 2023-05-02 CN claimed
US-8822619-B1 Directed self assembly copolymer composition and related methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-09-02 US claimed
US-20140227445-A1 Directed self assembly copolymer composition and related methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-08-14 US claimed
CN-103980648-A Directed self assembly copolymer composition and related methods DOW GLOBAL TECHNOLOGIES LLC 2014-08-13 CN claimed
US-8450418-B2 Methods of forming block copolymers, and block copolymer compositions MICRON TECHNOLOGY, INC. (US) 2013-05-28 US claimed
US-20130017335-A1 METHODS OF FORMING BLOCK COPOLYMERS, AND BLOCK COPOLYMER COMPOSITIONS MICRON TECHNOLOGY, INC. (US) 2013-01-17 US claimed
CN-116041596-B Star polar polymer and preparation method thereof 辽宁科之镁新材料研究有限公司 2024-04-26 CN disclosed
CN-116041596-A Star polar polymer and preparation method thereof 辽宁科之镁新材料研究有限公司 2023-05-02 CN disclosed
US-9593234-B2 Rubber composition having intramolecular double bond THE YOKOHAMA RUBBER CO., LTD. (JP) 2017-03-14 US disclosed
US-20150329708-A1 RUBBER COMPOSITION HAVING INTRAMOLECULAR DOUBLE BOND THE YOKOHAMA RUBBER CO., LTD. (JP) 2015-11-19 US disclosed
CN-103571252-B Thermal annealing process ROHM & HAAS ELECT MAT 2015-06-17 CN disclosed
CN-103571253-B High temperature thermal annealing process ROHM & HAAS ELECT MAT 2015-06-03 CN disclosed
US-8304493-B2 Methods of forming block copolymers MICRON TECHNOLOGY, INC. (US) 2012-11-06 US disclosed
US-20120046415-A1 METHODS OF FORMING BLOCK COPOLYMERS, METHODS OF FORMING A SELF-ASSEMBLED BLOCK COPOLYMER STRUCTURE AND RELATED COMPOSITIONS MICRON TECHNOLOGY, INC. (US) 2012-02-23 US disclosed
US-7220791-B2 Styrene-hypophosphite adduct, a process for preparation thereof, and its use CLARIANT PRODUKTE (DEUTSCHLAND) GMBH (DE) 2007-05-22 US disclosed
US-20040242738-A1 Styrene-hypophosphite adduct, a process for preparation thereof, and its use CLARIANT GMBH 2004-12-02 US disclosed
US-6486272-B1 METAL COMPOUND INTERACTS WITH A VINYL COMPOUND WITH A FUNCTIONAL GROUP TO MASK IT AND COPOLYMERIZING WITH A STYRENE IN THE PRESENCE OF TRANSITION METAL COMPOUND, OXYGEN COMPOUNDS WHICH FORM IONIC COMPLEXES, AND AN ORGANOMETALLIC COMPOUND IDEMITSU PETROCHEMICAL CO., LTD. (JP) 2002-11-26 US disclosed
US-20020173605-A1 PROCESS FOR PRODUCING FUNCTIONAL STYRENE COPOLYMER AND FUNCTIONAL STYRENE COPOLYMER IDEMITSU KOSAN CO.,LTD. (JP) 2002-11-21 US disclosed
EP-1219649-A1 PROCESS FOR PRODUCING FUNCTIONAL STYRENE COPOLYMER AND FUNCTIONAL STYRENE COPOLYMER IDEMITSU PETROCHEMICAL CO., LTD. (JP) 2002-07-03 EP disclosed