SCHEMBL21164018

SCHEMBL21164018

CC(C)(C)CC(C)(C)C(=O)OC1CC2CC1CC2C#N

nearest known ligand 0.30

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
▸ DPP4 P27487 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2754977 0.87 DPP4 (0.30) DPP4
SCHEMBL13823373 0.79 — —
SCHEMBL14295511 0.77 — —
SCHEMBL23059482 0.72 — —
SCHEMBL304110 0.71 ALDH1A1 (0.31) —
SCHEMBL21505907 0.71 ALDH1A1 (0.31) —
SCHEMBL24687529 0.71 ALDH1A1 (0.31) —
SCHEMBL10033541 0.70 HMGCR (0.31) —
SCHEMBL13758098 0.70 — —
SCHEMBL10180043 0.69 ATM (0.30) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2681623-B1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM FUJIFILM CORP (JP) 2019-07-10 — — EP disclosed
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