⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20616202 | 0.85 | PDE2A (0.31) | — | |
| SCHEMBL20616199 | 0.81 | AR (0.31) | — | |
| SCHEMBL13293496 | 0.79 | TUBB1 (0.42) | — | |
| SCHEMBL31062883 | 0.71 | TPMT (0.41) | — | |
| SCHEMBL1473852 | 0.70 | — | — | |
| SCHEMBL24931097 | 0.69 | CES2 (0.50) | — | |
| SCHEMBL27417243 | 0.68 | HDAC1 (0.48) | — | |
| SCHEMBL7910357 | 0.68 | VRK1 (0.34) | — | |
| SCHEMBL1474214 | 0.67 | HDAC1 (0.31) | — | |
| SCHEMBL3695749 | 0.67 | LMNA (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11215925-B2 | Method of forming resist pattern | ZEON CORPORATION (JP) | 2022-01-04 | — | — | US | disclosed |
| US-20210072643-A1 | METHOD OF FORMING RESIST PATTERN | ZEON CORPORATION (JP) | 2021-03-11 | — | — | US | disclosed |