SCHEMBL2315747

SCHEMBL2315747

C=CC(=O)OCc1cccc(Oc2ccccc2)c1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MMP1 P03956 2/20 0.55
MMP2 P08253 1/20 0.54
MMP9 P14780 1/20 0.54
MMP12 P39900 1/20 0.54
TDP1 Q9NUW8 2/20 0.52
LMNA P02545 1/20 0.52
ADRA2A P08913 1/20 0.52
CNR1 P21554 1/20 0.52
ATM Q13315 1/20 0.52
L3MBTL1 Q9Y468 1/20 0.52
THRB P10828 1/20 0.51
FFAR1 O14842 5/20 0.51
FFAR4 Q5NUL3 3/20 0.51
F13A1 P00488 1/20 0.48
TGM2 P21980 1/20 0.48
TGM1 P22735 1/20 0.48
CETP P11597 1/20 0.48
HCAR2 Q8TDS4 4/20 0.46
AKR1C3 P42330 1/20 0.45
FDFT1 P37268 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29434741 1.00 MMP1 (0.55) MMP1MMP2MMP9MMP12TDP1
SCHEMBL10065594 0.86 THRB (0.47) MMP1MMP2MMP9MMP12TDP1
SCHEMBL2429423 0.86 THRB (0.55) MMP2LMNATHRBFFAR1FFAR4
SCHEMBL22129584 0.86 THRB (0.60) THRBFFAR1FFAR4HCAR2FDFT1
SCHEMBL22710559 0.85 MMP1 (0.42) MMP1MMP2MMP9MMP12TDP1
SCHEMBL227301 0.84 HCAR2 (0.51) LMNAL3MBTL1THRBTGM2HCAR2
SCHEMBL10891722 0.84 MMP1 (0.54) MMP1MMP2MMP9MMP12
SCHEMBL11204265 0.83 TDP1 (0.59) MMP1MMP2MMP9MMP12TDP1
SCHEMBL25247933 0.82 THRB (0.56) THRBFFAR1FDFT1
SCHEMBL34054 0.82 HCAR2 (0.65) TDP1LMNAL3MBTL1THRBTGM2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 803 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2026106292-A1 DISPERSION COMPRISING CARBON MATERIAL, AND LITHIUM SULFIDE SECONDARY BATTERY USING SAME 주식회사 한솔케미칼 2026-05-21 WO claimed
CN-119462617-B Anti-ultraviolet agent, preparation method thereof, resin mixture and application thereof 珠海莫界科技有限公司 2026-05-19 CN claimed
EP-4733840-A1 PHOTOSENSITIVE RESIN COMPOSITION, FILM-SHAPED RESIN, AND RESIN SHEET Resonac Corporation (JP) 2026-04-29 EP claimed
US-12344691-B2 Resin composition for stereolithography KURARAY NORITAKE DENTAL INC. (JP) 2025-07-01 US claimed
CN-120137111-A Composition for 3D ink-jet printing and preparation method and application thereof 珠海赛纳三维科技有限公司 2025-06-13 CN claimed
US-12325813-B2 Optical clear adhesive composition, optical clear adhesive layer, and method of forming optical clear adhesive layer INTERFACE TECHNOLOGY (CHENGDU) CO., LTD. (CN) 2025-06-10 US claimed
WO-2025085828-A1 SYSTEM AND METHOD FOR CONTROLLED POLYMER DEPOLYMERIZATION Intropic Materials Corporation (US) 2025-04-24 WO claimed
US-20250129391-A1 SYSTEM AND METHOD FOR CONTROLLED POLYMER DEPOLYMERIZATION Intropic Materials Corporation (US) 2025-04-24 US claimed
CN-113906068-B Resin composition for optical modeling 可乐丽则武齿科株式会社 2025-02-25 CN claimed
CN-119462617-A High-curing anti-ultraviolet agent, preparation method thereof, resin mixture and application thereof 珠海莫界科技有限公司 2025-02-18 CN claimed
CN-115836239-A Resin composition, optical fiber, and method for producing optical fiber 住友电气工业株式会社 2023-03-21 CN claimed
WO-2023277297-A1 COPOLYMER DISPERSANT AND DISPERSION USING SAME 주식회사 한솔케미칼 2023-01-05 WO claimed
CN-115197664-A Optical adhesive composition, optical adhesive film and method for producing optical adhesive film 业成科技(成都)有限公司 2022-10-18 CN claimed
US-20220259361-A1 RESIN COMPOSITION FOR STEREOLITHOGRAPHY KURARAY NORITAKE DENTAL INC. (JP) 2022-08-18 US claimed
EP-3981810-A1 RESIN COMPOSITION FOR OPTICAL SHAPING Kuraray Noritake Dental Inc. (JP) 2022-04-13 EP claimed
CN-113906068-A Resin composition for stereolithography 可乐丽则武齿科株式会社 2022-01-07 CN claimed
WO-2022004122-A1 RESIN COMPOSITION, OPTICAL FIBER, AND METHOD FOR PRODUCING OPTICAL FIBER 住友電気工業株式会社 2022-01-06 WO claimed
CN-110446729-B Photocurable composition, artificial nail, method for generating modeling data, method for manufacturing artificial nail, and system for manufacturing artificial nail 三井化学株式会社 2021-11-09 CN claimed
WO-2020246610-A1 RESIN COMPOSITION FOR OPTICAL SHAPING クラレノリタケデンタル株式会社 2020-12-10 WO claimed
US-20180215850-A1 PHOTOCURABLE RESIN COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME CHEM OPTICS INC. (KR) 2018-08-02 US claimed