SCHEMBL29434741

SCHEMBL29434741

C=CC(=O)OCc1cccc(Oc2ccccc2)c1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MMP1 P03956 2/20 0.55
MMP2 P08253 1/20 0.54
MMP9 P14780 1/20 0.54
MMP12 P39900 1/20 0.54
TDP1 Q9NUW8 2/20 0.52
LMNA P02545 1/20 0.52
ADRA2A P08913 1/20 0.52
CNR1 P21554 1/20 0.52
ATM Q13315 1/20 0.52
L3MBTL1 Q9Y468 1/20 0.52
THRB P10828 1/20 0.51
FFAR1 O14842 5/20 0.51
FFAR4 Q5NUL3 3/20 0.51
F13A1 P00488 1/20 0.48
TGM2 P21980 1/20 0.48
TGM1 P22735 1/20 0.48
CETP P11597 1/20 0.48
HCAR2 Q8TDS4 4/20 0.46
AKR1C3 P42330 1/20 0.45
FDFT1 P37268 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2315747 1.00 MMP1 (0.55) MMP1MMP2MMP9MMP12TDP1
SCHEMBL10065594 0.86 THRB (0.47) MMP1MMP2MMP9MMP12TDP1
SCHEMBL2429423 0.86 THRB (0.55) MMP2LMNATHRBFFAR1FFAR4
SCHEMBL22129584 0.86 THRB (0.60) THRBFFAR1FFAR4HCAR2FDFT1
SCHEMBL22710559 0.85 MMP1 (0.42) MMP1MMP2MMP9MMP12TDP1
SCHEMBL227301 0.84 HCAR2 (0.51) LMNAL3MBTL1THRBTGM2HCAR2
SCHEMBL10891722 0.84 MMP1 (0.54) MMP1MMP2MMP9MMP12
SCHEMBL11204265 0.83 TDP1 (0.59) MMP1MMP2MMP9MMP12TDP1
SCHEMBL25247933 0.82 THRB (0.56) THRBFFAR1FDFT1
SCHEMBL34054 0.82 HCAR2 (0.65) TDP1LMNAL3MBTL1THRBTGM2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025085828-A1 SYSTEM AND METHOD FOR CONTROLLED POLYMER DEPOLYMERIZATION Intropic Materials Corporation (US) 2025-04-24 WO claimed
US-20240052183-A1 PHOTOCURABLE COMPOSITION CANON KABUSHIKI KAISHA (JP) 2024-02-15 US claimed
CN-118978883-B Adhesive composition and adhesive film 广东皇冠新材料科技有限公司 2025-04-18 CN disclosed
CN-118978883-A Adhesive composition and adhesive film 广东皇冠新材料科技有限公司 2024-11-19 CN disclosed
US-20240343911-A1 NANO-ZIRCONIA MONOMER DISPERSION AND OPTICAL FILM SHANDONG SINOCERA FUNCTIONAL MATERIAL CO., LTD (CN) 2024-10-17 US disclosed
EP-4403606-A1 NANO-ZIRCONIA DISPERSION, PREPARATION METHOD THEREFOR, OBTAINED SINGLE DISPERSION, AND OPTICAL FILM Shandong Sinocera Functional Material Co., Ltd (CN) 2024-07-24 EP disclosed
CN-118255929-A Active energy ray polymerizable resin composition and laminate 爱天思株式会社 2024-06-28 CN disclosed
US-20240052183-A1 PHOTOCURABLE COMPOSITION CANON KABUSHIKI KAISHA (JP) 2024-02-15 US disclosed
CN-116583406-A Photocurable composition 佳能株式会社 2023-08-11 CN disclosed
WO-2022244450-A1 PHOTOCURABLE PRESSURE-SENSITIVE ADHESIVE AND USES THEREOF 日東電工株式会社 2022-11-24 WO disclosed
WO-2022132431-A1 PHOTOCURABLE COMPOSITION CANON KABUSHIKI KAISHA (JP) 2022-06-23 WO disclosed
US-11261267-B1 Photocurable composition CANON KABUSHIKI KAISHA (JP) 2022-03-01 US disclosed