SCHEMBL227301

SCHEMBL227301

C=CC(=O)OCc1cccc(COC(=O)C=C)c1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HCAR2 Q8TDS4 4/20 0.51
LMNA P02545 1/20 0.46
THRB P10828 1/20 0.46
AKR1B10 O60218 2/20 0.42
AKR1B1 P15121 2/20 0.42
CA12 O43570 1/20 0.42
CA4 P22748 1/20 0.42
CA6 P23280 1/20 0.42
CA5A P35218 1/20 0.42
CA7 P43166 1/20 0.42
CA9 Q16790 1/20 0.42
CA14 Q9ULX7 1/20 0.42
CA5B Q9Y2D0 1/20 0.42
TTR P02766 1/20 0.42
ALDH1A1 P00352 6/20 0.41
TGM2 P21980 1/20 0.41
TSHR P16473 4/20 0.41
TP53 P04637 2/20 0.41
HIF1A Q16665 2/20 0.41
CYP3A4 P08684 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24270436 0.93 HCAR2 (0.47) HCAR2LMNATHRBAKR1B10AKR1B1
SCHEMBL33527388 0.92 HCAR2 (0.46) HCAR2LMNATHRBAKR1B10AKR1B1
SCHEMBL28325729 0.92 ENPP2 (0.46) HCAR2LMNATHRBALDH1A1CYP3A4
SCHEMBL21244248 0.92 HCAR2 (0.46) HCAR2LMNATHRBALDH1A1TSHR
SCHEMBL24172399 0.92 HCAR2 (0.49) HCAR2LMNATHRBAKR1B10AKR1B1
SCHEMBL19487306 0.92 ALDH1A1 (0.56) HCAR2LMNATHRBAKR1B10AKR1B1
SCHEMBL19456975 0.92 HCAR2 (0.46) HCAR2LMNATHRBAKR1B10AKR1B1
SCHEMBL1898363 0.91 HCAR2 (0.48) HCAR2LMNATHRBAKR1B10AKR1B1
SCHEMBL9555012 0.90 HCAR2 (0.47) HCAR2LMNATHRBAKR1B10AKR1B1
SCHEMBL2029341 0.90 IDO1 (0.51) HCAR2LMNATHRBAKR1B10AKR1B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 245 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4381083-A1 POLYMERIC NANOPARTICLE FORMULATIONS FOR TARGETED MRNA DELIVERY Universidade de Coimbra (PT) 2024-06-12 EP claimed
US-20240052183-A1 PHOTOCURABLE COMPOSITION CANON KABUSHIKI KAISHA (JP) 2024-02-15 US claimed
EP-3039707-B1 CURABLE COMPOSITION FOR PHOTOIMPRINT AND METHOD OF PRODUCING FILM, OPTICAL COMPONENT, CIRCUIT BOARD, OR ELECTRONIC COMPONENT USING THE COMPOSITION CANON KK (JP) 2023-03-22 EP claimed
WO-2023037311-A1 POLYMERIC NANOPARTICLE FORMULATIONS FOR TARGETED MRNA DELIVERY UNIVERSIDADE DE COIMBRA (PT) 2023-03-16 WO claimed
CN-110275394-B Curable composition, cured product and method for producing the same, and method for producing optical component, circuit board and electronic component 佳能株式会社 2022-12-06 CN claimed
US-12629718-B2 Film forming method and article manufacturing method CANON KABUSHIKI KAISHA (JP) 2026-05-19 US disclosed
US-12600820-B2 Photocurable composition with high silicon content CANON KABUSHIKI KAISHA (JP) 2026-04-14 US disclosed
US-20260077385-A1 FILM FORMING METHOD, CURABLE COMPOSITION, AND ARTICLE MANUFACTURING METHOD CANON KABUSHIKI KAISHA (JP) 2026-03-19 US disclosed
US-20260042932-A1 COMPOSITION, PATTERN FORMING METHOD, AND ARTICLE MANUFACTURING METHOD CANON KK (JP) 2026-02-12 US disclosed
US-20250368802-A1 PHOTOCURABLE COMPOSITION WITH HIGH SILICON CONTENT AND HIGH STABILITY CANON KK (JP) 2025-12-04 US disclosed
US-20250328075-A1 PHOTOCURABLE COMPOSITION FOR FORMING AN IMPRINT LITHOGRAPHY TEMPLATE CANON KK (JP) 2025-10-23 US disclosed
US-12428508-B2 Photocurable composition including a non-reactive polymer CANON KABUSHIKI KAISHA (JP) 2025-09-30 US disclosed
US-20110059302-A1 CURABLE COMPOSITION FOR IMPRINT, PATTERNING METHOD AND PATTERN FUJIFILM CORPORATION (JP) 2011-03-10 US disclosed
US-20100164368-A1 RADIATION- OR THERMALLY-CURABLE BARRIER SEALANTS NATIONAL STARCH AND CHEMICAL INVESTMENT HOLDING CO (DE) 2010-07-01 US disclosed
US-20100164368-A1 RADIATION- OR THERMALLY-CURABLE BARRIER SEALANTS NATIONAL STARCH AND CHEMICAL INVESTMENT HOLDING CO (DE) 2010-07-01 US disclosed
US-20100009138-A1 CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN FUJIFILM CORPORATION (JP) 2010-01-14 US disclosed
US-20100009138-A1 CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN FUJIFILM CORPORATION (JP) 2010-01-14 US disclosed
US-20100009287-A1 CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN FUJIFILM CORPORATION (JP) 2010-01-14 US disclosed
US-20100009287-A1 CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN FUJIFILM CORPORATION (JP) 2010-01-14 US disclosed
WO-2007111606-A1 RADIATION-OR THERMALLY-CURABLE BARRIER SEALANTS NATIONAL STARCH AND CHEMICAL INVESTMENT HOLDING CORPORATION (US) 2007-10-04 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260077385-A1 FILM FORMING METHOD, CURABLE COMPOSITION, AND ARTICLE MANUFACTURING METHOD EEF1D, RHOA, YWHAH HCAR2 4824/4885LMNA 931/4885THRB 4240/4885
US-20110059302-A1 CURABLE COMPOSITION FOR IMPRINT, PATTERNING METHOD AND PATTERN DNMT3L, DNMT3A, DNMT1 HCAR2 3607/4885LMNA 1591/4885THRB 3163/4885
US-20260042932-A1 COMPOSITION, PATTERN FORMING METHOD, AND ARTICLE MANUFACTURING METHOD SMCHD1, PIM1, PIM2 HCAR2 4882/4885LMNA 848/4885THRB 4787/4885
US-12629718-B2 Film forming method and article manufacturing method AUP1, VCL, RHOA HCAR2 4831/4885LMNA 899/4885THRB 3585/4885
US-12600820-B2 Photocurable composition with high silicon content BIRC2, ACP1, IRS1 HCAR2 2899/4885LMNA 901/4885THRB 4666/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.