Known targets — ChEMBL curated mechanism
GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQ
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL28544705 | 0.95 | — | — | |
| SCHEMBL145746 | 0.95 | — | — | |
| Ammonia Solution, Strong SCHEMBL28303810 | 0.91 | DNM1 (0.38) | — | |
| SCHEMBL7550469 | 0.90 | — | — | |
| Bromide SCHEMBL10390815 | 0.90 | DNM1 (0.47) | — | |
| SCHEMBL7550466 | 0.90 | — | — | |
| Fluoride Ion SCHEMBL1445551 | 0.90 | — | — | |
| Hydrochloric Acid SCHEMBL160342 | 0.90 | — | — | |
| Bromide SCHEMBL10390817 | 0.90 | DNM1 (0.42) | — | |
| Bromide SCHEMBL5087824 | 0.90 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2858 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260150612-A1 | SURFACE CONDITIONING PROCESSES FOR SEMICONDUCTOR PROCESSING CHAMBER PARTS | APPLIED MATERIALS, INC (US) | 2026-05-28 | — | — | US | claimed |
| CN-118022818-B | Isomerization method of o-cresol and catalyst used in isomerization method | ZHEJIANG XINHUA CHEMICAL CO.,LTD. (CN) | 2026-05-26 | — | — | CN | claimed |
| US-12630744-B2 | Polishing compositions and methods of use thereof | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2026-05-19 | — | — | US | claimed |
| US-12624317-B2 | Method of reducing defects on polished wafers | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2026-05-12 | — | — | US | claimed |
| US-12606916-B2 | Method for reducing or preventing corrosion or fouling caused by acidic compounds | KURITA WATER INDUSTRIES LTD. (JP) | 2026-04-21 | — | — | US | claimed |
| EP-3631045-B1 | CHEMICAL MECHANICAL POLISHING SLURRY FOR COBALT APPLICATIONS | FUJIFILM ELECTRONIC MAT USA INC (US) | 2026-02-18 | — | — | EP | claimed |
| US-20260042976-A1 | COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM ELECTRONIC MAT USA INC (US) | 2026-02-12 | — | — | US | claimed |
| EP-4688987-A1 | POLISHING COMPOSITIONS AND METHODS OF USE THEREOF | FUJIFILM Electronic Materials U.S.A, Inc. (US) | 2026-02-11 | — | — | EP | claimed |
| US-20260015560-A1 | COMPOSITIONS FOR POST-CMP CLEANING OF MICROELECTRONIC DEVICES | ENTEGRIS INC (US) | 2026-01-15 | — | — | US | claimed |
| EP-3894512-B1 | COMPOSITION AND METHOD FOR SELECTIVELY ETCHING RUTHENIUM AND/OR COPPER | ENTEGRIS INC (US) | 2025-12-24 | — | — | EP | claimed |
| WO-1999016855-A1 | CLEANING COMPOSITIONS AND METHODS FOR CLEANING RESIN AND POLYMERIC MATERIALS USED IN MANUFACTURE | KYZEN CORPORATION (US) | 1999-04-08 | — | — | WO | claimed |
| US-5846695-A | Removing agent composition for a photoresist and process for producing a semiconductor integrated circuit | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1998-12-08 | — | — | US | claimed |
| CN-1168897-A | Polycarbonate redistribution using diethyldimethylammonium hydroxide as catalyst | GEN ELECTRIC (US) | 1997-12-31 | — | — | CN | claimed |
| EP-0811647-A2 | Polycarbonate redistribution | GENERAL ELECTRIC COMPANY (US) | 1997-12-10 | — | — | EP | claimed |
| US-5650470-A | CATALYTIC AMOUNT OF DIETHYLDIMETHYLAMMONIUM HYDROXIDE FOR REDISTRIBUTION OF POLYCARBONATES | GENERAL ELECTRIC COMPANY (US) | 1997-07-22 | — | — | US | claimed |
| US-5149682-A | Stirring the mixed solution, slurrying, precipitation, recovering, drying | W. R. GRACE & CO. -CONN. (US) | 1992-09-22 | — | — | US | claimed |
| US-5023067-A | Aqueous slurry consisting of homogeneous dispersion of coprecipitated metal carbonates and quaternary ammonium salts | W. R. GRACE & CO.-CONN. (US) | 1991-06-11 | — | — | US | claimed |
| CN-1040572-A | The preparation method and the goods thereof of pottery | GRACE W R & CO (US) | 1990-03-21 | — | — | CN | claimed |
| EP-0355252-A2 | Manufacturing method for ceramics and products thereof | W.R. Grace & Co.-Conn. (US) | 1990-02-28 | — | — | EP | claimed |
| EP-0306973-A2 | Manufacturing method for superconducting ceramics and products thereof | W.R. Grace & Co.-Conn. (US) | 1989-03-15 | — | — | EP | claimed |