SCHEMBL23234941

SCHEMBL23234941

CCCCCCCC(Cc1ccccc1[N+](=O)[O-])OC(N)=O

nearest known ligand 0.45

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ L3MBTL1 Q9Y468 1/20 0.42
▸ KMT2A Q03164 4/20 0.42
▸ MEN1 O00255 2/20 0.42
▸ GAA P10253 1/20 0.41
▸ HPGD P15428 1/20 0.41
▸ POLB P06746 1/20 0.40
▸ CYP2C19 P33261 1/20 0.40
▸ MAOB P27338 1/20 0.39
▸ ALDH1A1 P00352 2/20 0.39
▸ BCHE P06276 1/20 0.38
▸ ACHE P22303 1/20 0.38
▸ TP53 P04637 1/20 0.38
▸ TSHR P16473 1/20 0.38
▸ GLA P06280 1/20 0.38
▸ PRSS1 P07477 1/20 0.38
▸ PRSS2 P07478 1/20 0.38
▸ PRSS3 P35030 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1507806 0.77 POLB (0.47) L3MBTL1KMT2AMEN1HPGDPOLB
SCHEMBL4529244 0.77 L3MBTL1 (0.45) L3MBTL1KMT2AMEN1GAAHPGD
SCHEMBL26168090 0.76 ALDH1A1 (0.46) L3MBTL1KMT2AMEN1HPGDPOLB
SCHEMBL3612596 0.75 L3MBTL1 (0.46) L3MBTL1KMT2AMEN1GAAHPGD
SCHEMBL19415531 0.75 HTT (0.44) L3MBTL1GAAHPGDCYP2C19ALDH1A1
SCHEMBL10877914 0.75 ALDH1A1 (0.43) L3MBTL1KMT2AMEN1HPGDPOLB
Hydrochloric Acid SCHEMBL394994 0.74 ALDH1A1 (0.43) L3MBTL1KMT2AMEN1GAAHPGD
SCHEMBL10909755 0.74 KMT2A (0.46) L3MBTL1KMT2AMEN1GAAHPGD
SCHEMBL4530158 0.74 L3MBTL1 (0.43) L3MBTL1KMT2AMEN1GAAHPGD
SCHEMBL1053905 0.74 MAOB (0.45) L3MBTL1KMT2AMEN1GAAHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11796919-B2 Resist pattern formation method OSAKA UNIVERSITY (JP) 2023-10-24 — — US disclosed
US-20210216016-A1 RESIST PATTERN FORMATION METHOD OSAKA UNIVERSITY (JP) 2021-07-15 — — US disclosed
EP-3809206-A1 RESIST PATTERN FORMATION METHOD Osaka University (JP) 2021-04-21 — — EP disclosed
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