Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5441240 | 0.83 | ALDH1A1 (0.32) | ALDH1A1TSHRSPHK1THRB | |
| SCHEMBL9702134 | 0.82 | ALDH1A1 (0.43) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| SCHEMBL10684191 | 0.81 | THRB (0.35) | THRB | |
| SCHEMBL5450674 | 0.80 | — | — | |
| SCHEMBL8865873 | 0.74 | ALDH1A1 (0.52) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| SCHEMBL7780205 | 0.74 | THRB (0.33) | THRB | |
| SCHEMBL769092 | 0.73 | — | — | |
| SCHEMBL10605765 | 0.72 | ALDH1A1 (0.50) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| SCHEMBL98646 | 0.72 | ALDH1A1 (0.50) | ALDH1A1TSHRMAPK1MEN1KMT2A | |
| SCHEMBL29081046 | 0.72 | ALDH1A1 (0.50) | ALDH1A1TSHRMAPK1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 220 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2295438-B2 | PROCESS FOR PRODUCING HYDROXYALKYLTRIETHYLENEDIAMINE COMPOUND, AND CATALYST COMPOSITION FOR THE PRODUCTION OF POLYURETHANE RESIN USING THE HYDROXYALKYLTRIETHYLENEDIAMINE COMPOUND | TOSOH CORP (JP) | 2025-03-26 | — | — | EP | claimed |
| EP-2295438-B1 | PROCESS FOR PRODUCING HYDROXYALKYLTRIETHYLENEDIAMINE COMPOUND, AND CATALYST COMPOSITION FOR THE PRODUCTION OF POLYURETHANE RESIN USING THE HYDROXYALKYLTRIETHYLENEDIAMINE COMPOUND | TOSOH CORP (JP) | 2015-03-18 | — | — | EP | claimed |
| US-20110077376-A1 | PROCESS FOR PRODUCING HYDROXYALKYLTRIETHYLENEDIAMINE, AND CATALYST COMPOSITION FOR THE PRODUCTION OF POLYURETHANE RESIN USING IT | TOSOH CORPORATION (JP) | 2011-03-31 | — | — | US | claimed |
| EP-2295438-A1 | PROCESS FOR PRODUCING HYDROXYALKYLTRIETHYLENEDIAMINE COMPOUND, AND CATALYST COMPOSITION FOR THE PRODUCTION OF POLYURETHANE RESIN USING THE HYDROXYALKYLTRIETHYLENEDIAMINE COMPOUND | Tosoh Corporation (JP) | 2011-03-16 | — | — | EP | claimed |
| EP-0489553-B1 | Photosensitive polymeric printing medium and water developable printing plates | NAPP SYSTEMS INC (US) | 1997-05-28 | — | — | EP | claimed |
| US-5348844-A | Domains of latex and elastomer bound by photopolymerizable compounds filling interstices, flexography | NAPP SYSTEMS, INC. (US) | 1994-09-20 | — | — | US | claimed |
| EP-0489553-A1 | Photosensitive polymeric printing medium and water developable printing plates | NAPP SYSTEMS INC. (US) | 1992-06-10 | — | — | EP | claimed |
| EP-4190832-B1 | POLYISOCYANATE COMPOSITION, COATING COMPOSITION AND COATED SUBSTRATE | ASAHI CHEMICAL IND (JP) | 2026-04-08 | — | — | EP | disclosed |
| EP-3959217-B1 | IMPROVEMENTS IN OR RELATING TO CURATIVES | HEXCEL COMPOSITES LTD (GB) | 2025-10-15 | — | — | EP | disclosed |
| US-20250270376-A1 | FILM FOR LATEX INK | LINTEC CORPORATION (JP) | 2025-08-28 | — | — | US | disclosed |
| EP-4585594-A1 | GLYCIDYL GROUP-CONTAINING COMPOUND, CURABLE RESIN COMPOSITION, CURED PRODUCT AND MULTILAYER BODY | DIC Corporation (JP) | 2025-07-16 | — | — | EP | disclosed |
| EP-4328273-B1 | BLOCKED ISOCYANATE COMPOSITION, AQUEOUS DISPERSION, COATING COMPOSITION AND COATING FILM | ASAHI CHEMICAL IND (JP) | 2025-06-25 | — | — | EP | disclosed |
| WO-2025105118-A1 | EPOXY RESIN COMPOSITION, CURED PRODUCT THEREOF, AND DISASSEMBLING METHOD | DIC株式会社 | 2025-05-22 | — | — | WO | disclosed |
| EP-0489553-B1 | Photosensitive polymeric printing medium and water developable printing plates | NAPP SYSTEMS INC (US) | 1997-05-28 | — | — | EP | disclosed |
| US-5348844-A | Domains of latex and elastomer bound by photopolymerizable compounds filling interstices, flexography | NAPP SYSTEMS, INC. (US) | 1994-09-20 | — | — | US | disclosed |
| EP-0261910-B1 | Water-developable photosensitive plate and its production | NIPPON PAINT CO LTD (JP) | 1994-03-30 | — | — | EP | disclosed |
| US-5175076-A | Copolymer resin for light sensitive elements of diene, alpha, beta-unsaturated carboxylic acids and vinyl monomers, a basic nitrogen compound and an unsaturated monomer | NIPPON PAINT CO., LTD. (JP) | 1992-12-29 | — | — | US | disclosed |
| EP-0489553-A1 | Photosensitive polymeric printing medium and water developable printing plates | NAPP SYSTEMS INC. (US) | 1992-06-10 | — | — | EP | disclosed |
| EP-0261910-A2 | Water-developable photosensitive plate and its production | Nippon Paint Co., Ltd. (JP) | 1988-03-30 | — | — | EP | disclosed |
| WO-1988002135-A1 | WATER-DEVELOPABLE PHOTOSENSITIVE PLATE AND ITS PRODUCTION | NAPP SYSTEMS (USA), INC. (US) | 1988-03-24 | — | — | WO | disclosed |