Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HPGD | P15428 | 5/20 | 0.58 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.58 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.58 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.58 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.58 |
| ▸ | GSK3A | P49840 | 1/20 | 0.55 |
| ▸ | GSK3B | P49841 | 1/20 | 0.55 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.53 |
| ▸ | MEN1 | O00255 | 3/20 | 0.53 |
| ▸ | MAPT | P10636 | 1/20 | 0.53 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.53 |
| ▸ | DAO | P14920 | 1/20 | 0.52 |
| ▸ | LMNA | P02545 | 1/20 | 0.50 |
| ▸ | HTT | P42858 | 1/20 | 0.50 |
| ▸ | PNP | P00491 | 1/20 | 0.50 |
| ▸ | P2RX4 | Q99571 | 1/20 | 0.50 |
| ▸ | F2 | P00734 | 1/20 | 0.50 |
| ▸ | PLG | P00747 | 1/20 | 0.50 |
| ▸ | ELANE | P08246 | 1/20 | 0.50 |
| ▸ | CTSG | P08311 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9453672 | 0.84 | GSK3A (0.57) | HPGDALDH1A1KDM4ESMN1; SMN2CYP3A4 | |
| SCHEMBL11721250 | 0.82 | P2RX4 (0.49) | HPGDALDH1A1KDM4ESMN1; SMN2KMT2A | |
| SCHEMBL7608593 | 0.82 | LMNA (0.46) | HPGDALDH1A1KDM4ESMN1; SMN2CYP3A4 | |
| SCHEMBL28562224 | 0.79 | KMT2A (0.60) | ALDH1A1KDM4ESMN1; SMN2GSK3AGSK3B | |
| SCHEMBL6363070 | 0.79 | ALDH1A1 (0.54) | HPGDALDH1A1KDM4ESMN1; SMN2CYP3A4 | |
| SCHEMBL8985073 | 0.79 | GSK3B (0.67) | HPGDALDH1A1KDM4ESMN1; SMN2CYP3A4 | |
| SCHEMBL319866 | 0.76 | KMT2A (0.73) | HPGDALDH1A1KDM4ESMN1; SMN2CYP3A4 | |
| SCHEMBL2762074 | 0.76 | LMNA (0.81) | HPGDALDH1A1KDM4ESMN1; SMN2CYP3A4 | |
| SCHEMBL25130124 | 0.75 | HPGD (0.68) | HPGDALDH1A1KDM4ESMN1; SMN2CYP3A4 | |
| SCHEMBL5402346 | 0.75 | HPGD (0.50) | HPGDALDH1A1KDM4ESMN1; SMN2CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115716737-A | High-strength rubber concrete containing composite fiber interface filler and preparation method thereof | 黄庆华 | 2023-02-28 | — | — | CN | claimed |
| JP-52000290-A | — | — | None | — | — | JP | disclosed |
| CN-122095316-A | Composition for forming resist underlayer film | — | 2026-05-26 | — | — | CN | disclosed |
| WO-2025095106-A1 | RESIST UNDERLAYER FILM FORMATION COMPOSITION | 日産化学株式会社 | 2025-05-08 | — | — | WO | disclosed |
| CN-114746468-B | Method for producing polymer | 日产化学株式会社 | 2024-09-13 | — | — | CN | disclosed |
| US-20230103242-A1 | METHOD FOR PRODUCING POLYMER | NISSAN CHEMICAL CORPORATION (JP) | 2023-03-30 | — | — | US | disclosed |
| CN-115716737-A | High-strength rubber concrete containing composite fiber interface filler and preparation method thereof | 黄庆华 | 2023-02-28 | — | — | CN | disclosed |
| US-20230029997-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2023-02-02 | — | — | US | disclosed |
| CN-114761876-A | Composition for forming resist underlayer film | 日产化学株式会社 | 2022-07-15 | — | — | CN | disclosed |
| CN-114746468-A | Method for producing polymer | 日产化学株式会社 | 2022-07-12 | — | — | CN | disclosed |
| US-7425399-B2 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-09-16 | — | — | US | disclosed |
| US-20080206680-A1 | Composition for forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-08-28 | — | — | US | disclosed |
| US-20080038678-A1 | Condensation Type Polymer-Containing Anti-Reflective Coating For Semiconductor | NISSAN CHEMICAL INDUSTRIES LTD. (JP) | 2008-02-14 | — | — | US | disclosed |
| US-20080003524-A1 | Sulfonate-Containing Anti-Reflective Coating Forming Composition for Lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2008-01-03 | — | — | US | disclosed |
| EP-1813987-A1 | SULFONIC-ESTER-CONTAINING COMPOSITION FOR FORMATION OF ANTIREFLECTION FILM FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2007-08-01 | — | — | EP | disclosed |
| CN-1965268-A | Antireflection film for semiconductor containing condensation type polymer | NISSAN CHEMICAL IND LTD (JP) | 2007-05-16 | — | — | CN | disclosed |
| EP-1757986-A1 | ANTIREFLECTION FILM FOR SEMICONDUCTOR CONTAINING CONDENSATION TYPE POLYMER | Nissan Chemical Industries, Ltd. (JP) | 2007-02-28 | — | — | EP | disclosed |
| US-20060290429-A1 | Composition form forming anti-reflective coating for use in lithography | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2006-12-28 | — | — | US | disclosed |
| EP-1560070-A1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM FOR LITHOGRAPHY | Nissan Chemical Industries, Ltd. (JP) | 2005-08-03 | — | — | EP | disclosed |
| JP-S52290-A | PROCESS FOR PREPARATION OF BENZYLISOCYANURATE | NISSAN CHEM IND LTD | 1977-01-05 | — | — | JP | disclosed |