SCHEMBL23382838

SCHEMBL23382838

CC(C)(C)OC(=O)Oc1ccc(C(=O)OC2(C(F)(F)C(=O)O)CCCCC2)cc1

nearest known ligand 0.49

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ ELANE P08246 5/20 0.49
▸ KDM1A O60341 1/20 0.37
▸ ADORA3 P0DMS8 2/20 0.36
▸ SLC6A2 P23975 3/20 0.33
▸ SLC6A3 Q01959 3/20 0.33
▸ SLC6A4 P31645 2/20 0.33
▸ MAPT P10636 1/20 0.33
▸ TDP1 Q9NUW8 1/20 0.33
▸ L3MBTL1 Q9Y468 1/20 0.33
▸ KMT2A Q03164 2/20 0.32
▸ ALDH1A1 P00352 1/20 0.32
▸ MEN1 O00255 1/20 0.31
▸ ESR1 P03372 1/20 0.30
▸ PGR P06401 1/20 0.30
▸ CHRM2 P08172 1/20 0.30
▸ AR P10275 1/20 0.30
▸ CHRM1 P11229 1/20 0.30
▸ CA2 P00918 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23383174 0.89 ADORA3 (0.40) ELANEADORA3SLC6A2SLC6A3SLC6A4
SCHEMBL23383170 0.88 CA12 (0.38) KDM1AADORA3TDP1ALDH1A1CA2
SCHEMBL23382835 0.86 ADORA3 (0.43) ADORA3SLC6A2SLC6A3SLC6A4MAPT
SCHEMBL23382837 0.80 ADORA3 (0.35) ADORA3SLC6A2SLC6A3SLC6A4TDP1
SCHEMBL23382836 0.80 ADORA3 (0.35) ADORA3SLC6A2SLC6A3SLC6A4TDP1
SCHEMBL23382834 0.80 ADORA3 (0.48) ADORA3SLC6A2SLC6A3SLC6A4
SCHEMBL23383172 0.79 CYP19A1 (0.37) ADORA3KMT2AALDH1A1MEN1
SCHEMBL23383171 0.78 KDM4E (0.37) ADORA3MAPTKMT2AMEN1
SCHEMBL23382833 0.77 ADORA3 (0.38) ADORA3SLC6A2SLC6A3SLC6A4TDP1
SCHEMBL23383175 0.76 ADRA1A (0.34) ADORA3TDP1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-19 — — US disclosed
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-19 — — US disclosed
US-20210149301-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-05-20 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process IDUA, SLC6A5, SLC6A9 ELANE 2435/4885KDM1A 2916/4885ADORA3 2841/4885
US-20210149301-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS IDUA, SLC6A5, SLC6A9 ELANE 2435/4885KDM1A 2916/4885ADORA3 2841/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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