Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KIF11 | P52732 | 2/20 | 0.38 |
| ▸ | ELANE | P08246 | 7/20 | 0.36 |
| ▸ | AURKA | O14965 | 1/20 | 0.33 |
| ▸ | TPX2 | Q9ULW0 | 1/20 | 0.33 |
| ▸ | AKR1C2 | P52895 | 1/20 | 0.32 |
| ▸ | AKR1C1 | Q04828 | 1/20 | 0.32 |
| ▸ | BACE1 | P56817 | 1/20 | 0.31 |
| ▸ | CA2 | P00918 | 3/20 | 0.31 |
| ▸ | CA1 | P00915 | 1/20 | 0.31 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
| ▸ | IKBKB | O14920 | 1/20 | 0.30 |
| ▸ | CHUK | O15111 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21794099 | 0.81 | HSD17B10 (0.50) | ELANEBACE1CA2HSD17B10 | |
| SCHEMBL21794138 | 0.78 | ELANE (0.50) | KIF11ELANEBACE1CA2CA1 | |
| SCHEMBL21794146 | 0.75 | SMN1; SMN2 (0.50) | BACE1CA2CA1 | |
| SCHEMBL21794143 | 0.75 | KMT2A (0.37) | BACE1HSD17B10 | |
| SCHEMBL14155779 | 0.75 | ELANE (0.51) | ELANECA2CA1 | |
| SCHEMBL21794096 | 0.75 | PDE5A (0.36) | KIF11AURKATPX2CA2CA1 | |
| SCHEMBL21794266 | 0.74 | ESR1 (0.50) | HSD17B10 | |
| SCHEMBL9543659 | 0.73 | HDAC1 (0.50) | KIF11ELANE | |
| SCHEMBL24995588 | 0.70 | KIF11 (0.44) | KIF11AKR1C2BACE1CA2CA1 | |
| SCHEMBL24995338 | 0.70 | ERN1 (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023162837-A1 | POSITIVE ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND COMPOUND | 富士フイルム株式会社 | 2023-08-31 | — | — | WO | disclosed |
| WO-2023162838-A1 | ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD | 富士フイルム株式会社 | 2023-08-31 | — | — | WO | disclosed |
| US-20210165325-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND COMPOUND | FUJIFILM CORPORATION (JP) | 2021-06-03 | — | — | US | disclosed |