SCHEMBL24995338

SCHEMBL24995338

COC(C)Oc1ccc(-c2cc(-c3ccc(OC(C)OC)cc3)c(S(=O)(=O)O)c(-c3ccc(OC(C)OC)cc3)c2)cc1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ERN1 O75460 1/20 0.36
▸ CYP2C19 P33261 2/20 0.36
▸ CYP1A2 P05177 1/20 0.36
▸ GAA P10253 1/20 0.36
▸ CYP2C9 P11712 1/20 0.36
▸ PKM P14618 1/20 0.36
▸ MCL1 Q07820 2/20 0.35
▸ MAP4K4 O95819 3/20 0.35
▸ PRKAB2 O43741 1/20 0.34
▸ PRKAG1 P54619 1/20 0.34
▸ PRKAA2 P54646 1/20 0.34
▸ PRKAA1 Q13131 1/20 0.34
▸ PRKAG3 Q9UGI9 1/20 0.34
▸ PRKAG2 Q9UGJ0 1/20 0.34
▸ PRKAB1 Q9Y478 1/20 0.34
▸ MMP9 P14780 3/20 0.33
▸ MMP1 P03956 2/20 0.33
▸ MMP2 P08253 2/20 0.33
▸ MMP3 P08254 2/20 0.33
▸ MMP7 P09237 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24995588 0.90 KIF11 (0.44) MMP9MMP1MMP2MMP3MMP7
SCHEMBL25006154 0.89 CYP1A2 (0.44) CYP2C19CYP1A2GAACYP2C9PKM
SCHEMBL25006129 0.87 PPARA (0.42) CYP2C19CYP1A2GAACYP2C9PKM
SCHEMBL23432887 0.83 PRKAB2 (0.34) ERN1CYP2C19CYP1A2GAACYP2C9
SCHEMBL21794146 0.83 SMN1; SMN2 (0.50) ERN1CYP2C19CYP1A2CYP2C9MAP4K4
SCHEMBL21794137 0.77 FYN (0.49) ERN1MAP4K4PRKAB2PRKAG1PRKAA2
SCHEMBL25005778 0.77 PPARA (0.47) CYP2C19CYP1A2GAACYP2C9PKM
SCHEMBL24996358 0.76 CYP1A2 (0.34) CYP2C19CYP1A2GAACYP2C9PKM
SCHEMBL21794099 0.76 HSD17B10 (0.50) GAAPKMTP53SMN1; SMN2
SCHEMBL21794096 0.76 PDE5A (0.36) CYP2C19CYP2C9MAP4K4PRKAB2PRKAG1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230038825-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION FOR MANUFACTURING PHOTOMASK, AND METHOD FOR MANUFACTURING PHOTOMASK FUJIFILM CORPORATION (JP) 2023-02-09 — — US disclosed
EP-4130878-A1 ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMATION METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION FOR MANUFACTURING PHOTOMASK, AND METHOD FOR MANUFACTURING PHOTOMASK FUJIFILM Corporation (JP) 2023-02-08 — — EP disclosed
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