SCHEMBL235279

SCHEMBL235279

CC(C)(CCCC#N)O[SiH3]

nearest known ligand 0.39

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.39
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31
ALDH1A1 P00352 1/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2864686 0.95 TSHR (0.39) TSHRMEN1KMT2AALDH1A1TDP1
SCHEMBL5682726 0.86
SCHEMBL29144805 0.79 TSHR (0.40) TSHRMEN1KMT2AALDH1A1TDP1
SCHEMBL6747548 0.74 TSHR (0.41) TSHRMEN1KMT2A
SCHEMBL6515502 0.74 TSHR (0.36) TSHR
SCHEMBL1225264 0.73 TSHR (0.33) TSHRALDH1A1TDP1
SCHEMBL4185634 0.72 ALDH3A1 (0.35)
SCHEMBL4192196 0.72 ALDH3A1 (0.35)
SCHEMBL1521860 0.72
SCHEMBL28677191 0.71 MEN1 (0.38) TSHRMEN1KMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 122 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108231573-B Etching composition and method for manufacturing semiconductor device by using the same 三星电子株式会社 2024-01-16 CN claimed
EP-1339727-B1 PROCESS FOR PREPARING PRIMARY AMINOORGANOSILANES GEN ELECTRIC (US) 2006-09-13 EP claimed
EP-1634885-A1 Process for preparing primary aminoorganosilanes General Electric Company (US) 2006-03-15 EP claimed
EP-1448569-A1 PROCESS FOR PREPARING BIS(SILYLORGANO)AMINES General Electric Company (US) 2004-08-25 EP claimed
EP-1339727-A1 PROCESS FOR PREPARING PRIMARY AMINOORGANOSILANES Crompton Corporation (US) 2003-09-03 EP claimed
WO-2003044027-A1 PROCESS FOR PREPARING BIS(SILYLORGANO) AMINES GENERAL ELECTRIC COMPANY (US) 2003-05-30 WO claimed
US-6417381-B1 HYDROGENATION OF CYANOORGANOSILANE USING RHODIUM, RUTHENIUM, PALLADIUM, OR PLATINUM CATALYST CROMPTON CORPORATION 2002-07-09 US claimed
WO-2002046202-A1 PROCESS FOR PREPARING PRIMARY AMINOORGANOSILANES CROMPTON CORPORATION (US) 2002-06-13 WO claimed
US-6242627-B1 BY DIRECT CATALYZED REACTION OF CYANOORGANOSILANE WITH HYDROGEN REDUCING SPONTANEOUS COMBUSTION HAZARD IN OXYGEN-CONTAINING ENVIRONMENT; ALKALI METAL ALKOXIDE INHIBITS OR SUPPRESS FORMATION OF SECONDARY AMINOORGANOSILANES CROMPTON COMPANY 2001-06-05 US claimed
WO-1992005433-A1 CONTINUOUS POSITIVE CHARGE CAPILLARY COLUMNS USED IN CAPILLARY ELECTROPHORESIS KERR ROBERT (FR) 1992-04-02 WO claimed
US-20250026962-A1 COMPOSITION FOR ETCHING AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME SOULBRAIN CO., LTD. (KR) 2025-01-23 US disclosed
US-12163058-B2 Semiconductor element SOULBRAIN CO., LTD. (KR) 2024-12-10 US disclosed
US-12146076-B2 Semiconductor element SOULBRAIN CO., LTD. (KR) 2024-11-19 US disclosed
US-12012525-B2 Composition for etching and manufacturing method of semiconductor device using the same SOULBRAIN CO., LTD. (KR) 2024-06-18 US disclosed
US-11912902-B2 Composition for etching and manufacturing method of semiconductor device using the same SOULBRAIN CO., LTD. (KR) 2024-02-27 US disclosed
US-5609907-A SURFACE ENHANCED RAMAN SCATTERING THE PENN STATE RESEARCH FOUNDATION (US) 1997-03-11 US disclosed
EP-0527007-B1 Process for preparation of primary aminoorganosilanes DOW CORNING (US) 1996-10-23 EP disclosed
US-5480919-A Functional polyorganosiloxane emulsions from monohydrolyzable silanes and photo curable compositions therefrom DOW CORNING CORPORATION (US) 1996-01-02 US disclosed
EP-0527007-A1 Process for preparation of primary aminoorganosilanes DOW CORNING CORPORATION (US) 1993-02-10 EP disclosed
WO-1992005433-A1 CONTINUOUS POSITIVE CHARGE CAPILLARY COLUMNS USED IN CAPILLARY ELECTROPHORESIS KERR ROBERT (FR) 1992-04-02 WO disclosed