SCHEMBL235342

SCHEMBL235342

CN(C)c1ccc2ccccc2c1O

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EP300 Q09472 1/20 0.57
KAT2B Q92831 1/20 0.57
KAT8 Q9H7Z6 1/20 0.57
PTPN22 Q9Y2R2 1/20 0.54
MCL1 Q07820 1/20 0.52
TDP1 Q9NUW8 2/20 0.46
MAPT P10636 2/20 0.46
KDM4E B2RXH2 1/20 0.46
SIGMAR1 Q99720 1/20 0.46
LDHA P00338 1/20 0.46
ALDH1A1 P00352 1/20 0.44
CYP2A6 P11509 1/20 0.44
TSHR P16473 1/20 0.44
HSD17B10 Q99714 1/20 0.44
CHEK1 O14757 1/20 0.44
NEK2 P51955 1/20 0.44
LIMK1 P53667 1/20 0.44
DYRK1A Q13627 1/20 0.44
CLK4 Q9HAZ1 1/20 0.44
MEN1 O00255 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL711267 0.90 HPRT1 (0.52) EP300KAT2BKAT8PTPN22MCL1
SCHEMBL29974868 0.90 HPRT1 (0.52) EP300KAT2BKAT8PTPN22MCL1
Hydrochloric Acid SCHEMBL27746571 0.79 TSHR (0.54) EP300KAT2BKAT8PTPN22MCL1
SCHEMBL10904256 0.79 PTPN22 (0.48) PTPN22TDP1MAPTKDM4ESIGMAR1
SCHEMBL25969099 0.77 GAA (0.53) PTPN22MAPTLDHAALDH1A1MEN1
SCHEMBL29861991 0.77 TSHR (0.56) EP300KAT2BKAT8MCL1TDP1
SCHEMBL29548528 0.77 ALDH1A1 (0.46) EP300KAT2BKAT8MCL1TDP1
SCHEMBL380067 0.77 ALDH1A1 (0.46) EP300KAT2BKAT8MCL1TDP1
SCHEMBL13021638 0.77 TSHR (0.56) EP300KAT2BKAT8MCL1TDP1
Hydrochloric Acid SCHEMBL31515359 0.76 SIGMAR1 (0.61) EP300KAT2BKAT8MCL1TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2059333-B1 AMINE AQUEOUS SOLUTION FOR FORMING AN ACTIVE LAYER OF POLYAMIDE REVERSE OSMOSIS COMPOSITE MEMBRANE AND PREPARATION METHOD OF POLYAMIDE REVERSE OSMOSIS COMPOSITE MEMBRANE USING THE SAME WOONGJINCOWAY CO LTD (KR) 2012-10-31 EP claimed
US-20120003387-A1 AMINE AQUEOUS SOLUTION FOR FORMING AN ACTIVE LAYER OF POLYAMIDE REVERSE OSMOSIS COMPOSITE MEMBRANE, POLYAMIDE REVERSE OSMOSIS COMPOSITE MEMBRANE PREPARED THEREBY, AND PREPARATION METHOD THEREOF KIM YOUN-KOOK (KR) 2012-01-05 US claimed
JP-4827968-B2 2011-11-30 JP claimed
US-20100181250-A1 AMINE AQUEOUS SOLUTION FOR FORMING AN ACTIVE LAYER OF POLYAMIDE REVERSE OSMOSIS COMPOSITE MEMBRANE, POLYAMIDE REVERSE OSMOSIS COMPOSITE MEMBRANE PREPARED THEREBY, AND PREPARATION METHOD THEREOF WOONGJINCOWAY CO., LTD. (KR) 2010-07-22 US claimed
EP-2059333-A1 AMINE AQUEOUS SOLUTION FOR FORMING AN ACTIVE LAYER OF POLYAMIDE REVERSE OSMOSIS COMPOSITE MEMBRANE, POLYAMIDE REVERSE OSMOSIS COMPOSITE MEMBRANE PREPARED THEREBY, AND PREPARATION METHOD THEREOF Woongjincoway Co, Ltd. (KR) 2009-05-20 EP claimed
WO-2008030006-A1 AMINE AQUEOUS SOLUTION FOR FORMING AN ACTIVE LAYER OF POLYAMIDE REVERSE OSMOSIS COMPOSITE MEMBRANE, POLYAMIDE REVERSE OSMOSIS COMPOSITE MEMBRANE PREPARED THEREBY, AND PREPARATION METHOD THEREOF WOONGJINCOWAY CO, LTD, . (KR) 2008-03-13 WO claimed
US-9929348-B2 Organic semiconductor composition comprising organic semiconductor material and polymer compound FUJIFILM CORPORATION (JP) 2018-03-27 US disclosed
US-9343594-B2 Conductive composition, conductive member and production method thereof, touch panel, and solar cell FUJIFILM CORPORATION (JP) 2016-05-17 US disclosed
US-9343594-B2 Conductive composition, conductive member and production method thereof, touch panel, and solar cell FUJIFILM CORPORATION (JP) 2016-05-17 US disclosed
US-20160064674-A1 ORGANIC SEMICONDUCTOR COMOSITION, ORGANIC THIN-FILM TRANSISTOR, ELECTRONIC PAPER, AND DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2016-03-03 US disclosed
US-20160064674-A1 ORGANIC SEMICONDUCTOR COMOSITION, ORGANIC THIN-FILM TRANSISTOR, ELECTRONIC PAPER, AND DISPLAY DEVICE FUJIFILM CORPORATION (JP) 2016-03-03 US disclosed
US-9224518-B2 Conductive composition, conductive member, conductive member production method, touch panel, and solar cell FUJIFILM CORPORATION (JP) 2015-12-29 US disclosed
US-9224518-B2 Conductive composition, conductive member, conductive member production method, touch panel, and solar cell FUJIFILM CORPORATION (JP) 2015-12-29 US disclosed
US-5470889-A Fire resistant roofing material THE CELOTEX CORPORATION (US) 1995-11-28 US disclosed
US-5405884-A Mixture of alkali or alkaline earth metal carboxylic salt, tertiary amine and quaternary ammonium carboxylic salt THE CELOTEX CORPORATION (US) 1995-04-11 US disclosed
US-5308883-A Rigid closed-cell foam from polyisocyanate and polyesterpolyol and blowing agent with catalyst THE CELOTEX CORPORATION (US) 1994-05-03 US disclosed
EP-0254097-A2 Catalyst mixtures for polyisocyanurate foam THE CELOTEX CORPORATION (US) 1988-01-27 EP disclosed
US-4710521-A SALT OF CARBOXYLIC ACIDS AND TERTIARY AMINES THE CELOTEX CORPORATION (US) 1987-12-01 US disclosed
US-4585722-A HIGH CONTRAST, HIGH SPEED, MULTICOLOR NIPPON TELEGRAPH & TELEPHONE PUBLIC CORPORATION (JP) 1986-04-29 US disclosed
US-RE30199-E Oxidation hair dyes based upon tetraaminopyrimidine developers HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (HENKEL KGAA) (DE) 1980-01-29 US disclosed