SCHEMBL25969099

SCHEMBL25969099

CC(=O)N(C(C)=O)c1ccc2ccccc2c1O

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 1/20 0.53
LDHA P00338 1/20 0.49
PTPN22 Q9Y2R2 1/20 0.47
ALDH1A1 P00352 1/20 0.42
MAPT P10636 1/20 0.42
HPGD P15428 1/20 0.42
CFTR P13569 1/20 0.42
PSEN1 P49768 1/20 0.40
PSEN2 P49810 1/20 0.40
APH1B Q8WW43 1/20 0.40
NCSTN Q92542 1/20 0.40
APH1A Q96BI3 1/20 0.40
PSENEN Q9NZ42 1/20 0.40
MEN1 O00255 1/20 0.40
KDM4A O75164 1/20 0.40
KMT2A Q03164 1/20 0.40
CTDSP1 Q9GZU7 1/20 0.40
KDM4C Q9H3R0 1/20 0.40
CYP1B1 Q16678 1/20 0.40
ABCG2 Q9UNQ0 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11024265 0.79 GAA (0.77) GAAALDH1A1MAPTHPGD
SCHEMBL235342 0.77 EP300 (0.57) GAALDHAPTPN22ALDH1A1MAPT
SCHEMBL25969096 0.75 PTPN1 (0.48) GAALDHAPTPN22ALDH1A1MAPT
SCHEMBL7189996 0.74 GAA (0.68) GAALDHAMAPTMEN1KMT2A
SCHEMBL25969112 0.74 GAA (0.52) GAALDHAALDH1A1MAPTHPGD
SCHEMBL10904256 0.73 PTPN22 (0.48) LDHAPTPN22MAPT
SCHEMBL25969106 0.72 MCL1 (0.65) GAAMAPTMEN1KMT2A
SCHEMBL431650 0.72 LDHA (0.69) LDHAPTPN22MAPTCFTRMEN1
SCHEMBL29390177 0.72 LDHA (0.69) LDHAPTPN22MAPTCFTRMEN1
SCHEMBL8379567 0.71 PTPN22 (0.47) LDHAPTPN22ALDH1A1HPGDCFTR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230260787-A1 COMPOSITION FOR FORMING PROTECTIVE FILM AGAINST ALKALINE AQUEOUS HYDROGEN PEROXIDE, SUBSTRATE FOR PRODUCING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR FORMING PATTERN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-17 US disclosed