Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.35 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.34 |
| ▸ | NLRP3 | Q96P20 | 1/20 | 0.34 |
| ▸ | MMP8 | P22894 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27829186 | 0.84 | ALDH1A1 (0.35) | ALDH1A1TSHRTDP1CYP3A4CYP1A2 | |
| SCHEMBL4106615 | 0.83 | CYP1A2 (0.33) | ALDH1A1CYP1A2CYP2D6CYP2C19LMNA | |
| SCHEMBL12872687 | 0.82 | — | — | |
| SCHEMBL12873254 | 0.82 | MMP8 (0.30) | MMP8 | |
| SCHEMBL8860901 | 0.82 | CYP3A4 (0.33) | ALDH1A1TSHRTDP1CYP3A4CYP1A2 | |
| SCHEMBL12687082 | 0.82 | CYP3A4 (0.33) | ALDH1A1TSHRTDP1CYP3A4CYP1A2 | |
| SCHEMBL9608672 | 0.82 | LMNA (0.39) | ALDH1A1TSHRTDP1CYP3A4CYP1A2 | |
| SCHEMBL19236697 | 0.82 | CYP3A4 (0.51) | ALDH1A1TSHRTDP1CYP3A4CYP1A2 | |
| SCHEMBL28528261 | 0.82 | CYP3A4 (0.51) | ALDH1A1TSHRTDP1CYP3A4CYP1A2 | |
| SCHEMBL786077 | 0.82 | CYP3A4 (0.33) | ALDH1A1TSHRTDP1CYP3A4CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 112 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11914300-B2 | Manufacturing method of semiconductor chip, and kit | FUJIFILM CORPORATION (JP) | 2024-02-27 | — | — | US | disclosed |
| US-11773266-B2 | Polymer, molded body, foam, resin composition, and production method for polymer | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-03 | — | — | US | disclosed |
| US-20230129965-A1 | HYDROPHILIC AND OLEOPHOBIC POLYMER | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-04-27 | — | — | US | disclosed |
| CN-110079244-A | A kind of solar cell package material, related glue film and solar cell module | 杭州福斯特应用材料股份有限公司 | 2019-08-02 | — | — | CN | disclosed |
| CN-109952360-A | Quantum dot dispersion liquid, self-luminous photosensitive polymer combination, the colour filter and image display device manufactured using it | 东友精细化工有限公司 | 2019-06-28 | — | — | CN | disclosed |
| CN-107112841-B | Thermosetting resin composition and rotating electrical machine using the same | 日立汽车系统株式会社 | 2019-05-31 | — | — | CN | disclosed |
| US-20180217503-A1 | TREATMENT LIQUID AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2018-08-02 | — | — | US | disclosed |
| US-20180171171-A1 | COATINGS | P2I LTD. (GB) | 2018-06-21 | — | — | US | disclosed |
| US-9915870-B2 | Pattern forming method, composition kit and resist film, and method for producing electronic device using them, and electronic device | FUJIFILM CORPORATION (JP) | 2018-03-13 | — | — | US | disclosed |
| US-20180030175-A1 | POLYMER | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-02-01 | — | — | US | disclosed |
| US-20110195362-A1 | RESIST UNDERLAYER FILM COMPOSITION, PROCESS FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS AND FULLERENE DERIVATIVE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-08-11 | — | — | US | disclosed |
| EP-2349974-A1 | PROCESS FOR THE PREPARATION OF ACYLATED SECONDARY ALCOHOL ALKOXYLATES AND SECONDARY ALCOHOL ALKOXYLATES | Shell Internationale Research Maatschappij B.V. (NL) | 2011-08-03 | — | — | EP | disclosed |
| US-20110091809-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-04-21 | — | — | US | disclosed |
| US-20100323305-A1 | PATTERN FORMING METHOD, RESIST COMPOSITION FOR MULTIPLE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, DEVELOPER FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, AND RINSING SOLUTION FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2010-12-23 | — | — | US | disclosed |
| US-20100239978-A1 | PHOTOSENSITIVE COMPOSITION, AND PATTERN-FORMING METHOD AND RESIST FILM USING THE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-09-23 | — | — | US | disclosed |
| US-20100209848-A1 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-08-19 | — | — | US | disclosed |
| US-20100159389-A1 | RESIN, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-06-24 | — | — | US | disclosed |
| WO-2010049465-A1 | PROCESS FOR THE PREPARATION OF ACYLATED SECONDARY ALCOHOL ALKOXYLATES AND SECONDARY ALCOHOL ALKOXYLATES | SHELL INTERNATIONALE RESEARCH MAATSCHAPPIJ B.V. (NL) | 2010-05-06 | — | — | WO | disclosed |
| EP-2181763-A1 | Catalyst and process for alkoxylation | Shell Internationale Research Maatschappij B.V. (NL) | 2010-05-05 | — | — | EP | disclosed |
| US-7465529-B2 | Radiation sensitive material and method for forming pattern | FUJITSU LIMITED (JP) | 2008-12-16 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110195362-A1 | RESIST UNDERLAYER FILM COMPOSITION, PROCESS FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS AND FULLERENE DERIVATIVE | PARG, TOP2A, FRG1 | ALDH1A1 3305/4885TSHR 4521/4885TDP1 2770/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.