SCHEMBL23587376

SCHEMBL23587376

Cc1cc(C2c3c(c(O)cc4ccccc34)Oc3c(O)cc4ccccc4c32)cc(C)c1O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 4/20 0.46
KMT2A Q03164 4/20 0.46
MAPT P10636 3/20 0.46
KDM4E B2RXH2 3/20 0.46
ALDH1A1 P00352 1/20 0.46
POLB P06746 1/20 0.46
LMNA P02545 2/20 0.39
HTT P42858 2/20 0.39
TRPM4 Q8TD43 1/20 0.38
PKM P14618 1/20 0.37
PTGS1 P23219 1/20 0.37
PTGS2 P35354 1/20 0.37
SIRT1 Q96EB6 1/20 0.36
NPSR1 Q6W5P4 2/20 0.36
HSP90AA1 P07900 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
MAPK1 P28482 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
CYP1A2 P05177 2/20 0.33
NQO2 P16083 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23900971 0.80 KDM4E (0.47) MEN1KMT2AMAPTKDM4EALDH1A1
SCHEMBL15998725 0.79 KDM4E (0.46) MEN1KMT2AMAPTKDM4EALDH1A1
SCHEMBL23900972 0.75 KDM4E (0.46) MEN1KMT2AMAPTKDM4EALDH1A1
SCHEMBL21755764 0.75 TRPM4 (0.38) MEN1KMT2AMAPTKDM4EALDH1A1
SCHEMBL11269491 0.73 KDM4E (0.46) MEN1KMT2AMAPTKDM4EALDH1A1
SCHEMBL2187057 0.69 TRPM4 (0.56) MEN1KMT2AMAPTKDM4EALDH1A1
SCHEMBL23900989 0.69 TRPM4 (0.40) MEN1KMT2AMAPTKDM4EALDH1A1
SCHEMBL6756905 0.65 MAPT (0.48) MEN1KMT2AMAPTKDM4EALDH1A1
SCHEMBL21755804 0.65 MEN1 (0.45) MEN1KMT2AALDH1A1LMNANPSR1
SCHEMBL23587401 0.65 MCL1 (0.39) MEN1KMT2AMAPTKDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3842491-A1 COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING INSULATING FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-06-30 EP disclosed