SCHEMBL23587442

SCHEMBL23587442

CC(C)(C)OC(=O)Oc1ccc2ccc3c(c2c1)C(c1cc(I)cc(I)c1O)c1c(ccc2ccc(O)cc12)O3

nearest known ligand 0.34

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
CA2 P00918 1/20 0.33
ELANE P08246 1/20 0.33
NPSR1 Q6W5P4 1/20 0.32
NQO2 P16083 1/20 0.32
MEN1 O00255 3/20 0.31
KMT2A Q03164 3/20 0.31
ALDH1A1 P00352 2/20 0.31
FGB P02675 1/20 0.31
HPGD P15428 1/20 0.31
TNNI3 P19429 1/20 0.31
TNNT2 P45379 1/20 0.31
RECQL P46063 1/20 0.31
TNNC1 P63316 1/20 0.31
KDM1A O60341 1/20 0.31
LMNA P02545 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23587441 0.89 NPSR1 (0.37) CA2ELANENPSR1NQO2MEN1
SCHEMBL23960174 0.87 ELANE (0.35) CA2ELANENPSR1KDM1A
SCHEMBL23587428 0.87 LMNA (0.33) NPSR1NQO2MEN1KMT2AALDH1A1
SCHEMBL23587443 0.81 NPSR1 (0.37) CA2ELANENPSR1NQO2MEN1
SCHEMBL18615296 0.79 MEN1 (0.37) CA2ELANENPSR1MEN1KMT2A
SCHEMBL21755770 0.79 NPSR1 (0.32) CA2NPSR1
SCHEMBL23960175 0.78 NPSR1 (0.38) CA2ELANENPSR1MEN1KMT2A
SCHEMBL18615248 0.77 NPSR1 (0.42) CA2ELANENPSR1MEN1KMT2A
SCHEMBL18613104 0.77 ELANE (0.38) CA2ELANENPSR1KMT2AALDH1A1
SCHEMBL21755780 0.76 SIRT2 (0.36) MEN1KMT2AALDH1A1FGBHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210331994-A1 COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR FORMING INSULATING FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-10-28 US disclosed
EP-3842491-A1 COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING INSULATING FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-06-30 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210331994-A1 COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR FORMING INSULATING FILM BMI1, PRDM9, CTCF CA2 4386/4885ELANE 3153/4885NPSR1 3828/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.