⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5176036 | 0.78 | — | — | |
| SCHEMBL9464242 | 0.77 | HSP90AA1 (0.35) | — | |
| SCHEMBL3220940 | 0.71 | — | — | |
| SCHEMBL4882180 | 0.71 | HSP90AA1 (0.31) | — | |
| SCHEMBL28795828 | 0.71 | HSP90AA1 (0.31) | — | |
| SCHEMBL6923004 | 0.69 | APLNR (0.30) | — | |
| SCHEMBL14600585 | 0.69 | HSP90AA1 (0.33) | — | |
| SCHEMBL2517677 | 0.69 | — | — | |
| SCHEMBL367068 | 0.69 | — | — | |
| SCHEMBL8570860 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 292 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107203095-B | White alkali-soluble photosensitive composition and preparation method and application thereof | 江苏广信感光新材料股份有限公司 | 2020-08-18 | — | — | CN | claimed |
| CN-107329368-B | Alkali-soluble photosensitive composition, and preparation method and application thereof | 江苏广信感光新材料股份有限公司 | 2020-08-14 | — | — | CN | claimed |
| CN-107329368-A | A kind of solvable photosensitive composite of alkali and preparation method and application | 江苏广信感光新材料股份有限公司 | 2017-11-07 | — | — | CN | claimed |
| CN-107203095-A | A kind of solvable photosensitive composite of white alkali and preparation method and application | 江苏广信感光新材料股份有限公司 | 2017-09-26 | — | — | CN | claimed |
| EP-1379199-A4 | COMPOSITION AND METHOD FOR PRODUCING SHAPABLE IMPLANTS i IN VIVO /i AND IMPLANTS PRODUCED THEREBY | CALHOUN VISION INC (US) | 2008-03-26 | — | — | EP | claimed |
| CN-101018514-A | Crosslinking of siloxanes | CALHOUN VISION INC (US) | 2007-08-15 | — | — | CN | claimed |
| US-20070129802-A1 | Composition and method for producing shapable implants in vivo and implants produced thereby | CALHOUN VISION, INC. (US) | 2007-06-07 | — | — | US | claimed |
| CN-1538827-A | Compositions and methods for making formable in vivo implants, and implants made thereby | — | 2004-10-20 | — | — | CN | claimed |
| JP-2004524111-A | — | — | 2004-08-12 | — | — | JP | claimed |
| EP-1379199-A2 | COMPOSITION AND METHOD FOR PRODUCING SHAPABLE IMPLANTS i IN VIVO /i AND IMPLANTS PRODUCED THEREBY | Calhoun Vision Inc. (US) | 2004-01-14 | — | — | EP | claimed |
| US-20020169505-A1 | Composition and method for producing shapable implants in vivo and implants produced thereby | JETHMALANI JAGDISH M (US) | 2002-11-14 | — | — | US | claimed |
| WO-2002076338-A2 | COMPOSITION AND METHOD FOR PRODUCING SHAPABLE IMPLANTS IN VIVO AND IMPLANTS PRODUCED THEREBY | CALHOUN VISION (US) | 2002-10-03 | — | — | WO | claimed |
| US-20240219833-A1 | BLACK RESIST COMPOSITION, AND METHOD FOR FORMING BLACK PATTERN BY NEAR-INFRARED PHOTOLITHOGRAPHIC METHOD | ECHEM SOLUTIONS JAPAN INC. (JP) | 2024-07-04 | — | — | US | disclosed |
| EP-4339701-A1 | BLACK RESIST COMPOSITION AND METHOD FOR FORMING BLACK PATTERN BY NEAR-INFRARED PHOTOLITHOGRAPHY | Echem Solutions Japan Inc. (JP) | 2024-03-20 | — | — | EP | disclosed |
| CN-117467346-A | High-ductility high-hardness film coating composition, coating and manufacturing method thereof | 光易科技(无锡)有限公司 | 2024-01-30 | — | — | CN | disclosed |
| CN-117222942-A | Black resist composition and method for forming black pattern by near infrared lithography | 日本光电子化学株式会社 | 2023-12-12 | — | — | CN | disclosed |
| CN-1316067-A | Colour changing composition and colouring polymeric articles made therefrom | VANTIKO LTD (GB) | 2001-10-03 | — | — | CN | disclosed |
| WO-2001071411-A2 | APPLICATION OF WAVEFRONT SENSOR TO LENSES CAPABLE OF POST-FABRICATION POWER MODIFICATION | CALIFORNIA INSTITUTE OF TECHNOLOGY (US) | 2001-09-27 | — | — | WO | disclosed |
| WO-2000041650-A1 | LENSES CAPABLE OF POST-FABRICATION POWER MODIFICATION | CALIFORNIA INSTITUTE OF TECHNOLOGY (US) | 2000-07-20 | — | — | WO | disclosed |
| US-3961961-A | POSITIVE OR NEGATIVE DEVELOPABLE PHOTOSENSITIVE COMPOSITION | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1976-06-08 | — | — | US | disclosed |