⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3629190 | 0.77 | — | — | |
| SCHEMBL7723039 | 0.71 | LMNA (0.31) | — | |
| SCHEMBL1574016 | 0.71 | LMNA (0.39) | — | |
| SCHEMBL367712 | 0.71 | HSP90AA1 (0.31) | — | |
| SCHEMBL6923004 | 0.69 | APLNR (0.30) | — | |
| SCHEMBL3819697 | 0.69 | SMN1; SMN2 (0.50) | — | |
| SCHEMBL2363479 | 0.69 | — | — | |
| SCHEMBL2517677 | 0.69 | — | — | |
| SCHEMBL367068 | 0.69 | — | — | |
| SCHEMBL9464242 | 0.65 | HSP90AA1 (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-103907057-A | Nanocomposite negative photosensitive composition and use thereof | AZ ELECTRONIC MATERIALS USA | 2014-07-02 | — | — | CN | disclosed |
| CN-101605854-B | Antireflective coating composition | AZ ELECTRONIC MATERIALS USA | 2012-07-25 | — | — | CN | disclosed |
| CN-101959980-A | Antireflective coating composition | AZ ELECTRONIC MATERIALS USA | 2011-01-26 | — | — | CN | disclosed |
| CN-101605854-A | Antireflective coating composition | AZ ELECTRONIC COATING COMPOSIT (US) | 2009-12-16 | — | — | CN | disclosed |
| CN-100568098-C | Radiation sensitive resin composition, its autofrettage and the manufacture method of using its semiconductor device | FASL JAPAN LTD (US) | 2009-12-09 | — | — | CN | disclosed |
| CN-101400723-A | Base soluble polymers for photoresist compositions | AZ ELECTRONIC MATERIALS USA (US) | 2009-04-01 | — | — | CN | disclosed |
| CN-101223205-A | Novel organic bottom antireflective polymer compositions | AZ ELECTRONIC MATERIALS USA (US) | 2008-07-16 | — | — | CN | disclosed |
| CN-1748181-A | Radiation-sensitive resin composition, process for producing the same and process for producing semiconductor device therewith | FASL JAPAN LTD (US) | 2006-03-15 | — | — | CN | disclosed |
| WO-1998010286-A1 | METHODS FOR PROCESSING CHEMICAL COMPOUNDS HAVING REACTIVE FUNCTIONAL GROUPS | ISIS PHARMACEUTICALS, INC. (US) | 1998-03-12 | — | — | WO | disclosed |
| WO-1998005961-A1 | COMPOUNDS HAVING A PLURALITY OF NITROGENOUS SUBSTITUENTS | ISIS PHARMACEUTICALS, INC. (US) | 1998-02-12 | — | — | WO | disclosed |