SCHEMBL2367141

SCHEMBL2367141

CCS(=O)(=O)[O-].CCS(=O)(=O)[O-].[Cu+2]

nearest known ligand 0.38

Known targets — ChEMBL curated mechanism

FGFR1FGFR2FGFR3FGFR4FLT1FLT4KDRPDGFRAPDGFRB

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
BBOX1 O75936 3/20 0.38
KDM4E B2RXH2 2/20 0.37
MAPT P10636 1/20 0.37
ALOX15 P16050 1/20 0.37
TSHR P16473 3/20 0.33
ALDH1A1 P00352 2/20 0.33
MAPK1 P28482 2/20 0.33
TP53 P04637 2/20 0.33
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
GMNN O75496 1/20 0.33
LMNA P02545 1/20 0.33
THPO P40225 1/20 0.33
HBB P68871 1/20 0.33
PMP22 Q01453 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
RECQL P46063 2/20 0.32
GLA P06280 1/20 0.32
HPGD P15428 1/20 0.32
EPHX2 P34913 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Zinc Ion SCHEMBL428649 0.91 BBOX1 (0.38) BBOX1KDM4EMAPTALOX15TSHR
SCHEMBL9001604 0.91 BBOX1 (0.38) BBOX1KDM4EMAPTALOX15TSHR
SCHEMBL20533678 0.91
SCHEMBL1552464 0.91 BBOX1 (0.38) BBOX1KDM4EMAPTALOX15TSHR
SCHEMBL20583852 0.91 BBOX1 (0.38) BBOX1KDM4EMAPTALOX15TSHR
SCHEMBL20533681 0.91 BBOX1 (0.38) BBOX1KDM4EMAPTALOX15TSHR
SCHEMBL22581623 0.91 BBOX1 (0.38) BBOX1KDM4EMAPTALOX15TSHR
SCHEMBL20533647 0.91 BBOX1 (0.38) BBOX1KDM4EMAPTALOX15TSHR
SCHEMBL19809549 0.91 BBOX1 (0.38) BBOX1KDM4EMAPTALOX15TSHR
SCHEMBL6915790 0.91

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 251 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024131535-A1 METAL PLATING COMPOSITION AND USE METHOD THEREFOR 宁波安集微电子科技有限公司 2024-06-27 WO claimed
WO-2024131536-A1 METAL PLATING COMPOSITION AND USE METHOD THEREFOR 宁波安集微电子科技有限公司 2024-06-27 WO claimed
CN-118241267-A Metal electroplating composition and application method thereof 宁波安集微电子科技有限公司 2024-06-25 CN claimed
CN-118241266-A Metal electroplating composition and application method thereof 宁波安集微电子科技有限公司 2024-06-25 CN claimed
CN-117684223-A Metal electroplating composition and application method thereof 宁波安集微电子科技有限公司 2024-03-12 CN claimed
CN-117684222-A Metal electroplating composition for electrolytic copper coating and application method thereof 宁波安集微电子科技有限公司 2024-03-12 CN claimed
WO-2024046450-A1 METAL PLATING COMPOSITION AND USE METHOD THEREFOR 宁波安集微电子科技有限公司 2024-03-07 WO claimed
WO-2024046447-A1 METAL ELECTROPLATING COMPOSITION FOR ELECTROLYTIC COPPER COATING AND USE METHOD THEREFOR 宁波安集微电子科技有限公司 2024-03-07 WO claimed
CN-112725851-B Chip copper interconnection electroplating additive, preparation method and application thereof 上海新阳半导体材料股份有限公司 2023-04-28 CN claimed
CN-112746292-B Chip copper interconnection electroplating additive, preparation method and application thereof 上海新阳半导体材料股份有限公司 2023-04-28 CN claimed
US-11332471-B2 Leveling agent, metal plating composition containing same, preparation method therefor and use thereof SHANGHAI SINYANG SEMICONDUCTOR MATERIALS CO., LTD. (CN) 2022-05-17 US claimed
CN-112795960-A Chip copper interconnection electroplating additive, preparation method and application thereof 上海新阳半导体材料股份有限公司 2021-05-14 CN claimed
CN-112760683-A Chip copper interconnection electroplating additive, preparation method and application thereof 上海新阳半导体材料股份有限公司 2021-05-07 CN claimed
CN-112746292-A Chip copper interconnection electroplating additive, preparation method and application thereof 上海新阳半导体材料股份有限公司 2021-05-04 CN claimed
CN-112725850-A Chip copper interconnection electroplating additive, preparation method and application thereof 上海新阳半导体材料股份有限公司 2021-04-30 CN claimed
CN-112725851-A Chip copper interconnection electroplating additive, preparation method and application thereof 上海新阳半导体材料股份有限公司 2021-04-30 CN claimed
CN-111218686-A Etching liquid composition 易安爱富科技有限公司 2020-06-02 CN claimed
EP-1338031-A2 COPPER ALLOY INTERCONNECTIONS FOR INTEGRATED CIRCUITS AND METHODS OF MAKING SAME INTEL CORPORATION (US) 2003-08-27 EP claimed
WO-2002045142-A9 COPPER ALLOY INTERCONNECTIONS FOR INTEGRATED CIRCUITS AND METHODS OF MAKING SAME INTEL CORP (US) 2003-02-06 WO claimed
WO-2002045142-A2 COPPER ALLOY INTERCONNECTIONS FOR INTEGRATED CIRCUITS AND METHODS OF MAKING SAME INTEL CORPORATION (US) 2002-06-06 WO claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11332471-B2 Leveling agent, metal plating composition containing same, preparation method therefor and use thereof PRPF8, CACNA1F, ATP1B2 BBOX1 3223/4885KDM4E 3340/4885MAPT 2766/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.