SCHEMBL23736358

SCHEMBL23736358

CCCCC(O)N(C(C)CC)C(O)CCCC

nearest known ligand 0.39

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
SPHK1 Q9NYA1 1/20 0.39
ALDH1A1 P00352 3/20 0.38
CA2 P00918 5/20 0.35
MAPK1 P28482 1/20 0.35
CA1 P00915 3/20 0.34
TSHR P16473 3/20 0.33
TP53 P04637 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.32
CYP3A4 P08684 1/20 0.32
FDPS P14324 1/20 0.32
DNM1 Q05193 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23736372 0.93 SPHK1 (0.47) SPHK1CA1TP53CYP3A4
SCHEMBL23736364 0.86 TSHR (0.36) SPHK1TSHR
SCHEMBL920167 0.83 ALDH1A1 (0.40) SPHK1ALDH1A1CA2MAPK1CA1
SCHEMBL23736385 0.81 TP53 (0.40) SPHK1ALDH1A1CA2MAPK1CA1
SCHEMBL23736388 0.78 TSHR (0.42) TSHR
SCHEMBL465349 0.75 GPR84 (0.44) SPHK1TP53CYP3A4FDPS
SCHEMBL23736361 0.74 TP53 (0.48) SPHK1CA1TP53CYP3A4FDPS
SCHEMBL21558503 0.74 ALDH1A1 (0.34) ALDH1A1CA2MAPK1CA1TSHR
SCHEMBL11449796 0.74 SPHK1 (0.45) SPHK1TP53CYP3A4
SCHEMBL37135 0.73 GPR84 (0.48) SPHK1TSHRTP53CYP3A4FDPS

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230104687-A1 NOVEL AMINE COMPOUND, ACID GAS ABSORBENT, METHOD FOR REMOVING ACID GAS, AND ACID GAS REMOVAL APPARATUS KABUSHIKI KAISHA TOSHIBA (JP) 2023-04-06 US disclosed
CN-115805003-A Novel amine compound, acid gas absorbent, method for removing acid gas, and acid gas removal device 株式会社东芝 2023-03-17 CN disclosed
US-11090603-B2 Acidic gas absorbent, acidic gas removal method and acidic gas removal apparatus KABUSHIKI KAISHA TOSHIBA (JP) 2021-08-17 US disclosed