SCHEMBL237553

SCHEMBL237553

CC1CCC(c2ccc(O)cc2)(c2ccc(O)cc2)CC1

nearest known ligand 0.59

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
ESR2 Q92731 15/20 0.59
ESR1 P03372 8/20 0.59
ALDH1A1 P00352 1/20 0.42
CYP1A2 P05177 1/20 0.42
MAPT P10636 1/20 0.42
CYP2C9 P11712 1/20 0.42
HPGD P15428 1/20 0.42
CYP2C19 P33261 1/20 0.42
RECQL P46063 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4407090 0.93 ESR2 (0.71) ESR2ESR1ALDH1A1CYP1A2MAPT
SCHEMBL9348569 0.89 ESR2 (0.52) ESR2ESR1ALDH1A1CYP1A2MAPT
SCHEMBL9352654 0.89 ESR2 (0.52) ESR2ESR1ALDH1A1CYP1A2MAPT
SCHEMBL9348579 0.89 ESR2 (0.52) ESR2ESR1ALDH1A1CYP1A2MAPT
SCHEMBL9849920 0.85 ESR2 (0.61) ESR2ESR1ALDH1A1CYP1A2MAPT
SCHEMBL9353769 0.84 ESR2 (0.47) ESR2ESR1ALDH1A1CYP1A2MAPT
SCHEMBL9353764 0.84 ESR2 (0.47) ESR2ESR1ALDH1A1CYP1A2MAPT
SCHEMBL10436113 0.83 ESR2 (0.53) ESR2ESR1ALDH1A1CYP1A2MAPT
SCHEMBL23241904 0.83 ACHE (0.61) ESR2ESR1ALDH1A1CYP1A2MAPT
SCHEMBL45825 0.83 ESR2 (0.64) ESR2ESR1ALDH1A1MAPTHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 446 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250110403-A1 PHOTOSENSITIVE COMPOSITION CONTAINING PFAS-FREE POLYCYCLOOLEFINIC POLYMERS AND SEMICONDUCTOR DEVICE MADE THEREOF PROMERUS, LLC (US) 2025-04-03 US claimed
WO-2025072614-A2 PHOTOSENSITIVE COMPOSITION CONTAINING PFAS-FREE POLYCYCLOOLEFINIC POLYMERS AND SEMICONDUCTOR DEVICE MADE THEREOF PROMERUS, LLC (US) 2025-04-03 WO claimed
WO-2025072607-A1 PHOTOSENSITIVE COMPOSITION CONTAINING PFAS FREE POLYCYCLOOLEFINIC TERPOLYMERS AND SEMICONDUCTOR DEVICE MADE THEREOF PROMERUS, LLC (US) 2025-04-03 WO claimed
US-20250110399-A1 PHOTOSENSITIVE COMPOSITION CONTAINING PFAS-FREE POLYCYCLOOLEFINIC TERPOLYMERS AND SEMICONDUCTOR DEVICE MADE THEREOF PROMERUS, LLC (US) 2025-04-03 US claimed
US-11537045-B2 Photosensitive compositions and applications thereof PROMERUS, LLC (US) 2022-12-27 US claimed
EP-4045564-A1 PHOTOSENSITIVE COMPOSITIONS AND APPLICATIONS THEREOF Promerus, LLC (US) 2022-08-24 EP claimed
US-20210116807-A1 PHOTOSENSITIVE COMPOSITIONS AND APPLICATIONS THEREOF PROMERUS, LLC (US) 2021-04-22 US claimed
US-20160223908-A1 PHOTOSENSITIVE COMPOSITIONS AND APPLICATIONS THEREOF PROMERUS, LLC (US) 2016-08-04 US claimed
US-9341949-B2 Photosensitive compositions and applications thereof PROMERUS, LLC (US) 2016-05-17 US claimed
US-20140322647-A1 PHOTOSENSITIVE COMPOSITIONS AND APPLICATIONS THEREOF SUMITOMO BAKELITE CO., LTD (JP) 2014-10-30 US claimed
US-6734278-B2 MELT ESTER INTERCHANGE BAYER AKTIENGESELLSCHAFT (DE) 2004-05-11 US claimed
US-20030139564-A1 Production of polyester carbonates BAYER AKTIENGESELLSCHAFT (DE) 2003-07-24 US claimed
US-5238775-A Alkali-soluble resin and photoinitiator comprising a 1,2-quinone diazide sulfonate derivative of 1,1-bis (hydroxyphenyl)-1-(4-(4-hydroxybenzyl)ethanes; positive photoresists; heat resistance; inhibits scum JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1993-08-24 US claimed
US-12600116-B2 Special polymer layers for faster laminability of multilayer structures COVESTRO DEUTSCHLAND AG (DE) 2026-04-14 US disclosed
US-12516177-B2 High voltage components ENVALIOR DEUTSCHLAND GMBH (DE) 2026-01-06 US disclosed
WO-2025228904-A1 LAYER STRUCTURE WITH AT LEAST TWO LAYERS HAVING DIFFERENT ENGRAVINGS COVESTRO DEUTSCHLAND AG (DE) 2025-11-06 WO disclosed
US-4755616-A 4,4-bis(4-hydroxyphenyl)cyclohexanecarboxylic acid derivatives and process for preparing same MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1988-07-05 US disclosed
US-4723046-A CATALYTIC DEHYDROGENATION OF 4,4-BIS(4-HYDROXYPHENYL) CYCLOHEXANOL MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1988-02-02 US disclosed
EP-0251614-A1 Process for the preparation of 4,4'-biphenol MITSUI TOATSU CHEMICALS, Inc. (JP) 1988-01-07 EP disclosed
EP-0238305-A1 4,4-Bis(4-hydroxyphenyl)cyclohexanecarboxylic acid derivatives and process for preparing same MITSUI TOATSU CHEMICALS, Inc. (JP) 1987-09-23 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12600116-B2 Special polymer layers for faster laminability of multilayer structures ASH2L, SMC2, ELL ESR2 2120/4885ESR1 1394/4885ALDH1A1 4181/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.