Anthraquinone

Anthraquinone

SCHEMBL23780306

O=C1c2ccccc2C(=O)c2ccccc21.[N-]=[N+]=NS(=O)(=O)N=[N+]=[N-]

nearest known ligand 0.52

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.52
KMT2A Q03164 3/20 0.52
CDC25B P30305 3/20 0.52
MAOA P21397 5/20 0.44
RAB9A P51151 3/20 0.44
SMN1; SMN2 Q16637 3/20 0.44
MAPT P10636 3/20 0.44
APAF1 O14727 2/20 0.44
TDP2 O95551 2/20 0.44
NPC1 O15118 2/20 0.44
MAPK1 P28482 2/20 0.44
KDM4E B2RXH2 2/20 0.44
LMNA P02545 2/20 0.44
POLB P06746 2/20 0.44
S100A4 P26447 2/20 0.44
BLM P54132 2/20 0.44
CES2 O00748 1/20 0.44
TERT O14746 1/20 0.44
PLIN1 O60240 1/20 0.44
S1PR4 O95977 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Naphthoquinone SCHEMBL106247 0.86 IDO1 (0.54) MEN1KMT2ACDC25BMAOARAB9A
Phthalic Anhydride SCHEMBL5178869 0.86 TDP1 (0.54) MEN1KMT2ACDC25BMAOARAB9A
Naphthalene SCHEMBL8355966 0.82 CYP2A6 (0.38) LMNACES2BCHECES1CYP3A4
Menadione SCHEMBL5902971 0.81 ALDH1A1 (0.66) MEN1KMT2ACDC25BMAOARAB9A
SCHEMBL10584897 0.81 SRC (0.31)
Biphenyl SCHEMBL413377 0.80 ALDH1A1 (0.41) ALDH1A1
1,2-Naphthoquinone SCHEMBL686745 0.79 PTPRC (0.65) MEN1KMT2ACDC25BMAOAMAPT
Fluorobenzene SCHEMBL27951760 0.78 KMT2A (0.38) MEN1KMT2AMAPK1TSHR
Anthraquinone SCHEMBL30003822 0.78 MEN1 (0.75) MEN1KMT2ACDC25BMAOARAB9A
Anthraquinone SCHEMBL2152357 0.78 MEN1 (0.75) MEN1KMT2ACDC25BMAOARAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11543749-B2 Resist composition and method for producing resist pattern, and method for producing plated molded article SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-01-03 US disclosed
US-20210278765-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN, AND METHOD FOR PRODUCING PLATED MOLDED ARTICLE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-09-09 US disclosed