SCHEMBL23780307

SCHEMBL23780307

CC([O])OCCOC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.38

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.38
MEN1 O00255 3/20 0.38
KMT2A Q03164 3/20 0.38
NPSR1 Q6W5P4 2/20 0.38
HTT P42858 2/20 0.38
EPHX2 P34913 2/20 0.36
CYP1A2 P05177 2/20 0.35
CYP2C9 P11712 2/20 0.35
CYP2C19 P33261 2/20 0.35
SMN1; SMN2 Q16637 4/20 0.35
TSHR P16473 2/20 0.35
LMNA P02545 4/20 0.33
KDM4E B2RXH2 1/20 0.33
SLC22A2 O15244 1/20 0.32
SLC47A1 Q96FL8 1/20 0.32
CYP17A1 P05093 1/20 0.32
CYP19A1 P11511 1/20 0.32
CYP3A4 P08684 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1174646 0.80 ALDH1A1 (0.35) ALDH1A1MEN1KMT2ANPSR1HTT
SCHEMBL4370709 0.80 ALDH1A1 (0.41) ALDH1A1MEN1KMT2ANPSR1HTT
SCHEMBL7083988 0.80 ALDH1A1 (0.41) ALDH1A1MEN1KMT2ANPSR1HTT
SCHEMBL1174643 0.78 NPSR1 (0.35) ALDH1A1MEN1KMT2ANPSR1HTT
SCHEMBL19798444 0.74 NPSR1 (0.43) ALDH1A1MEN1KMT2ANPSR1HTT
SCHEMBL1324043 0.74 ALDH1A1 (0.37) ALDH1A1MEN1KMT2ANPSR1HTT
SCHEMBL21998197 0.74 SMN1; SMN2 (0.36) ALDH1A1MEN1KMT2ANPSR1HTT
SCHEMBL482480 0.73 ALDH1A1 (0.41) ALDH1A1MEN1KMT2ANPSR1HTT
SCHEMBL1322591 0.73 ALDH1A1 (0.36) ALDH1A1MEN1KMT2ANPSR1HTT
SCHEMBL23780305 0.73 ALDH1A1 (0.48) ALDH1A1MEN1KMT2ANPSR1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11543749-B2 Resist composition and method for producing resist pattern, and method for producing plated molded article SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-01-03 US disclosed
US-20210278765-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN, AND METHOD FOR PRODUCING PLATED MOLDED ARTICLE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-09-09 US disclosed
CN-113296357-A Resist composition, method for producing resist pattern, and method for producing plated molded article 住友化学株式会社 2021-08-24 CN disclosed