SCHEMBL1174643

SCHEMBL1174643

CC(O[C]=O)OCCOC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.35

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 2/20 0.35
MEN1 O00255 2/20 0.35
KMT2A Q03164 2/20 0.35
ALDH1A1 P00352 2/20 0.35
HTT P42858 1/20 0.35
EPHX2 P34913 1/20 0.32
SMN1; SMN2 Q16637 3/20 0.32
TSHR P16473 1/20 0.32
LMNA P02545 2/20 0.30
KDM4E B2RXH2 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1174646 0.79 ALDH1A1 (0.35) NPSR1MEN1KMT2AALDH1A1HTT
SCHEMBL23780307 0.78 ALDH1A1 (0.38) NPSR1MEN1KMT2AALDH1A1HTT
SCHEMBL1174006 0.77 PRKCA (0.46) NPSR1MEN1KMT2AALDH1A1LMNA
SCHEMBL1324043 0.74 ALDH1A1 (0.37) NPSR1MEN1KMT2AALDH1A1HTT
SCHEMBL21998197 0.74 SMN1; SMN2 (0.36) NPSR1MEN1KMT2AALDH1A1HTT
SCHEMBL7083988 0.73 ALDH1A1 (0.41) NPSR1MEN1KMT2AALDH1A1HTT
SCHEMBL4370709 0.73 ALDH1A1 (0.41) NPSR1MEN1KMT2AALDH1A1HTT
SCHEMBL1322591 0.73 ALDH1A1 (0.36) NPSR1MEN1KMT2AALDH1A1HTT
SCHEMBL19798444 0.68 NPSR1 (0.43) NPSR1MEN1KMT2AALDH1A1HTT
SCHEMBL1173523 0.68

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8475999-B2 Compound and photoresist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-07-02 US disclosed
US-20110039208-A1 PHOTORESIST COMPOSITION CONTAINING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-02-17 US disclosed
US-20110039209-A1 COMPOUND AND PHOTORESIST COMPOSITION CONTAINING THE SAME SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-02-17 US disclosed
US-7205090-B2 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-04-17 US disclosed
US-7175963-B2 Chemical amplification type positive resist composition and a resin therefor SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-02-13 US disclosed
US-20050158656-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED 2005-07-21 US disclosed
US-20050100819-A1 Chemical amplification type positive resist composition and a resin therefor SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2005-05-12 US disclosed
US-6818379-B2 SULFONIUM SALT REPRESENTED BY THE FOLLOWING FORMULA (I): WHEREIN Q1, Q2 AND Q3 EACH INDEPENDENTLY REPRESENT HYDROGEN, HYDROXY, ALKYL HAVING 1 TO 6 CARBON ATOMS, OR ALKOXY HAVING 1 TO 6 CARBON ATOMS, BUT ALL OF Q1, Q2 AND Q3 ARE NOT THE SAME; SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-16 US disclosed
US-20030148211-A1 Sulfonium salt and use thereof SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-08-07 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110039209-A1 COMPOUND AND PHOTORESIST COMPOSITION CONTAINING THE SAME RCOR3, RCN1, HRH4 NPSR1 2214/4885MEN1 2367/4885KMT2A 2143/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.