Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.41 |
| ▸ | NPSR1 | Q6W5P4 | 4/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | HTT | P42858 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.39 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.35 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.35 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
| ▸ | ATM | Q13315 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | GLA | P06280 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7083988 | 0.87 | ALDH1A1 (0.41) | ALDH1A1NPSR1MEN1HTTKMT2A | |
| SCHEMBL23780307 | 0.80 | ALDH1A1 (0.38) | ALDH1A1NPSR1MEN1HTTKMT2A | |
| SCHEMBL4371197 | 0.78 | ALDH1A1 (0.49) | ALDH1A1NPSR1MEN1KMT2ASMN1; SMN2 | |
| SCHEMBL15532275 | 0.77 | NPSR1 (0.39) | ALDH1A1NPSR1MEN1HTTKMT2A | |
| SCHEMBL16669996 | 0.77 | NPSR1 (0.39) | ALDH1A1NPSR1MEN1HTTKMT2A | |
| SCHEMBL1499942 | 0.75 | SMN1; SMN2 (0.41) | ALDH1A1NPSR1SMN1; SMN2EPHX2CYP2C9 | |
| SCHEMBL1324043 | 0.75 | ALDH1A1 (0.37) | ALDH1A1NPSR1MEN1HTTKMT2A | |
| SCHEMBL1174646 | 0.74 | ALDH1A1 (0.35) | ALDH1A1NPSR1MEN1HTTKMT2A | |
| SCHEMBL1322591 | 0.74 | ALDH1A1 (0.36) | ALDH1A1NPSR1MEN1HTTKMT2A | |
| SCHEMBL1174643 | 0.73 | NPSR1 (0.35) | ALDH1A1NPSR1MEN1HTTKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7625689-B2 | better line edge roughness in excimer laser lithography; supramolecule ester useful in photoresists e.g. pentaerythritol, tetrakis(3-(methoxymethyloxycarbonyl)cyclohexanecarboxylate) aka PECHOM and other adamantanyl and norbornyl derivatives | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-12-01 | — | — | US | disclosed |
| US-7576223-B2 | Polymer of a (meth)acryloyloxy)ethoxycarbonyl)sulfonium sulfonate, e.g., 1-[2-(2-methylacryloyloxy)ethoxycarbonyl]tetrahydrothiophenium perfluorobutanesulfonate; used a an acid generator in excimer laser lithography; stable fine patterns without collapse and improved line edge roughness. | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-08-18 | — | — | US | disclosed |
| US-20080269506-A1 | Chemical amplification type resist composition | YAMADA AIRI | 2008-10-30 | — | — | US | disclosed |
| US-7396899-B2 | Chemical amplification type resist composition | SUMITOMO CHEMICAL CO., LTD. (JP) | 2008-07-08 | — | — | US | disclosed |
| US-20070123674-A1 | Chemical amplification type resist composition | YAMADA AIRI | 2007-05-31 | — | — | US | disclosed |
| US-20070088131-A1 | Sulfonate and resist composition | TOISHI KOUJI | 2007-04-19 | — | — | US | disclosed |
| US-7160669-B2 | Chemical amplification type resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-01-09 | — | — | US | disclosed |
| US-7135268-B2 | Using aromatic sulfonate compound | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-11-14 | — | — | US | disclosed |
| US-20060160017-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-07-20 | — | — | US | disclosed |
| US-7001706-B2 | Sulfonate and a resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2006-02-21 | — | — | US | disclosed |
| US-6951706-B2 | Sulfonate and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-10-04 | — | — | US | disclosed |
| US-20050014095-A1 | Sulfonate and a resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2005-01-20 | — | — | US | disclosed |
| US-20040152009-A1 | Sulfonate and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED | 2004-08-05 | — | — | US | disclosed |
| US-20040138353-A1 | Chemical amplification type resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-07-15 | — | — | US | disclosed |
| US-20040029037-A1 | Amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-02-12 | — | — | US | disclosed |
| US-20030180659-A1 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-09-25 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080269506-A1 | Chemical amplification type resist composition | ASIC1, POLR2B, POLR2A | ALDH1A1 1431/4885NPSR1 2485/4885MEN1 3196/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.