Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 6/20 | 0.51 |
| ▸ | NOS1 | P29475 | 2/20 | 0.51 |
| ▸ | POLB | P06746 | 1/20 | 0.51 |
| ▸ | MAOB | P27338 | 1/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.51 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.49 |
| ▸ | NAMPT | P43490 | 1/20 | 0.49 |
| ▸ | XDH | P47989 | 1/20 | 0.49 |
| ▸ | LMNA | P02545 | 2/20 | 0.47 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.47 |
| ▸ | TXNRD1 | Q16881 | 1/20 | 0.47 |
| ▸ | TXNRD3 | Q86VQ6 | 1/20 | 0.47 |
| ▸ | TXNRD2 | Q9NNW7 | 1/20 | 0.47 |
| ▸ | GRIA1 | P42261 | 1/20 | 0.47 |
| ▸ | GRIA2 | P42262 | 1/20 | 0.47 |
| ▸ | GRIA3 | P42263 | 1/20 | 0.47 |
| ▸ | GRIA4 | P48058 | 1/20 | 0.47 |
| ▸ | HPGD | P15428 | 1/20 | 0.45 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.45 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Silver SCHEMBL9173415 | 0.98 | MAPT (0.50) | MAPTNOS1POLBMAOBALDH1A1 | |
| SCHEMBL8424660 | 0.98 | MAPT (0.50) | MAPTNOS1POLBMAOBALDH1A1 | |
| SCHEMBL5335439 | 0.91 | NPBWR1 (0.46) | MAPTNOS1POLBMAOBALDH1A1 | |
| Alcohol SCHEMBL10712051 | 0.91 | ALDH1A1 (0.44) | MAPTNOS1POLBMAOBALDH1A1 | |
| SCHEMBL3887990 | 0.86 | CYP3A4 (0.57) | MAPTNOS1POLBMAOBALDH1A1 | |
| Benzotriazole SCHEMBL8919418 | 0.81 | CYP3A4 (0.56) | MAPTNOS1POLBMAOBALDH1A1 | |
| SCHEMBL9461432 | 0.79 | MAPT (0.67) | MAPTNOS1POLBMAOBALDH1A1 | |
| SCHEMBL17950465 | 0.78 | DAO (0.49) | MAPTNOS1POLBMAOBALDH1A1 | |
| SCHEMBL10879458 | 0.78 | MAPT (0.52) | MAPTNOS1POLBMAOBALDH1A1 | |
| SCHEMBL17950474 | 0.77 | TXNRD1 (0.42) | MAPTNOS1POLBMAOBALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2509 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4643371-A1 | COMPOSITION FOR SELECTIVELY REMOVING OXIDE COMPOUNDS AND ETCHING RESIDUES OF ONE OR BOTH OF CO AND CU | BASF SE (DE) | 2025-11-05 | — | — | EP | claimed |
| US-20250297194-A1 | CLEANING METHOD OF SEMICONDUCTOR DEVICE, CLEANING APPARATUS OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR CLEANING COMPOSITION | DAXIN MATERIALS CORPORATION (TW) | 2025-09-25 | — | — | US | claimed |
| EP-4621829-A1 | CLEANING METHOD OF SEMICONDUCTOR DEVICE, CLEANING APPARATUS OF SEMICONDUCTOR DEVICE AND SEMICONDUCTOR CLEANING COMPOSITION | Daxin Materials Corporation (TW) | 2025-09-24 | — | — | EP | claimed |
| EP-3774680-B1 | CLEANING COMPOSITIONS | FUJIFILM ELECTRONIC MAT USA INC (US) | 2025-09-24 | — | — | EP | claimed |
| US-12331239-B2 | Composition and process for selectively etching a layer comprising an aluminium compound in the presence of layers of low-k materials, copper and/or cobalt | BASF SE (DE) | 2025-06-17 | — | — | US | claimed |
| WO-2025108836-A1 | COMPOSITIONS FOR REMOVING PHOTORESIST AND ETCH RESIDUES, METHODS OF USING AND USE THEREOF | MERCK PATENT GMBH (DE) | 2025-05-30 | — | — | WO | claimed |
| US-12187984-B2 | Treatment liquid and method for treating object to be treated | FUJIFILM CORPORATION (JP) | 2025-01-07 | — | — | US | claimed |
| CN-119220353-A | Application of cleaning liquid | 上海新阳半导体材料股份有限公司 | 2024-12-31 | — | — | CN | claimed |
| CN-119220354-A | Cleaning liquid | 上海新阳半导体材料股份有限公司 | 2024-12-31 | — | — | CN | claimed |
| CN-119220352-A | Preparation method of cleaning liquid | 上海新阳半导体材料股份有限公司 | 2024-12-31 | — | — | CN | claimed |
| US-4983455-A | CORROSION RESISTANCE, SMOOTH RUNNING | HITACHI MAXELL, LTD. (JP) | 1991-01-08 | — | — | US | claimed |
| EP-0136582-B1 | DEVELOPER COMPOSITIONS FOR SILVER HALIDE PHOTOGRAPHIC MATERIALS | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1989-07-19 | — | — | EP | claimed |
| US-4810622-A | STABILITY | FUJI PHOTO FILM, CO. LTD. (JP) | 1989-03-07 | — | — | US | claimed |
| EP-0279381-A2 | Magnetic recording medium | Hitachi Maxell Ltd. (JP) | 1988-08-24 | — | — | EP | claimed |
| EP-0136582-A2 | Developer compositions for silver halide photographic materials | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1985-04-10 | — | — | EP | claimed |
| EP-0061986-A1 | Coated filament and composite thereof with rubber | THE GOODYEAR TIRE & RUBBER COMPANY (US) | 1982-10-06 | — | — | EP | claimed |
| US-4299670-A | WHERE SURFACE IS EXPOSED TO A BENZOTRIAZOLE COMPOUND | BELL TELEPHONE LABORATORIES, INCORPORATED (US) | 1981-11-10 | — | — | US | claimed |
| EP-0029720-A1 | The development of lithographic films | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1981-06-03 | — | — | EP | claimed |
| US-4105656-A | PROCESS FOR PREPARING 3-N-MONOSUBSTITUTED AMINO-4-SUBSTITUTED-5-PYRAZOLONES | FUJI PHOTO FILM CO., LTD. (JP) | 1978-08-08 | — | — | US | claimed |
| US-3933498-A | Fogged, direct positive silver halide emulsions containing a bleach inhibiting compound and a Dmin maintainer compound | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1976-01-20 | — | — | US | claimed |