Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PPM1B | O75688 | 5/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.41 |
| ▸ | TP53 | P04637 | 1/20 | 0.41 |
| ▸ | GAA | P10253 | 1/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | USP2 | O75604 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3818435 | 1.00 | PPM1B (0.50) | PPM1BKMT2AMEN1ALDH1A1KDM4E | |
| SCHEMBL13897079 | 0.86 | PPM1B (0.61) | PPM1BKMT2AMEN1ALDH1A1KDM4E | |
| SCHEMBL9697481 | 0.86 | PPM1B (0.61) | PPM1BKMT2AMEN1ALDH1A1KDM4E | |
| SCHEMBL11393084 | 0.86 | PPM1B (0.61) | PPM1BKMT2AMEN1ALDH1A1KDM4E | |
| SCHEMBL13480836 | 0.86 | PPM1B (0.61) | PPM1BKMT2AMEN1ALDH1A1KDM4E | |
| SCHEMBL6778458 | 0.86 | PPM1B (0.61) | PPM1BKMT2AMEN1ALDH1A1KDM4E | |
| SCHEMBL1005051 | 0.86 | PPM1B (0.61) | PPM1BKMT2AMEN1ALDH1A1KDM4E | |
| SCHEMBL1008906 | 0.83 | PPM1B (0.56) | PPM1BKMT2AMEN1ALDH1A1KDM4E | |
| SCHEMBL16790508 | 0.83 | PPM1B (0.56) | PPM1BKMT2AMEN1ALDH1A1KDM4E | |
| SCHEMBL16788624 | 0.83 | PPM1B (0.56) | PPM1BKMT2AMEN1ALDH1A1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4945144-A | POLYMERIZATION OF 7-OXANORBORNENE, IONOPHORES | CALIFORNIA INSTITUTE OF TECHNOLOGY (US) | 1990-07-31 | — | — | US | claimed |
| WO-2025047132-A1 | RESIN COMPOSITION, CURED FILM, ELECTRONIC COMPONENT, AND ORGANIC EL DISPLAY DEVICE | 東レ株式会社 | 2025-03-06 | — | — | WO | disclosed |
| WO-2024111466-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, ORGANIC EL DISPLAY DEVICE, ELECTRONIC COMPONENT, AND SEMICONDUCTOR DEVICE | 東レ株式会社 | 2024-05-30 | — | — | WO | disclosed |
| US-20230106185-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, AND ACID DIFFUSION SUPPRESSING AGENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-04-06 | — | — | US | disclosed |
| US-20230102353-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD FOR PRODUCING PHOTOSENSITIVE DRY FILM, METHOD FOR PRODUCING PATTERNED RESIST FILM, METHOD FOR PRODUCING SUBSTRATE PROVIDED WITH TEMPLATE, AND METHOD FOR PRODUCING A PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-03-30 | — | — | US | disclosed |
| US-11550221-B2 | Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and nitrogen-containing aromatic heterocyclic compound | TOKYO OHKA KOG YO CO., LTD. (JP) | 2023-01-10 | — | — | US | disclosed |
| US-11474432-B2 | Chemically amplified photosensitive composition, photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-10-18 | — | — | US | disclosed |
| US-20220204766-A1 | HIGH MOLECULAR WEIGHT FLEXIBLE CURABLE POLYIMIDES | DESIGNER MOLECULES, INC | 2022-06-30 | — | — | US | disclosed |
| US-20220026801-A1 | CHEMICALLY AMPLIFIED POSITIVE -TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, AND METHOD OF MANUFACTURING PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD (JP) | 2022-01-27 | — | — | US | disclosed |
| US-11131927-B2 | Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template and method of manufacturing plated article | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-09-28 | — | — | US | disclosed |
| US-4945144-A | POLYMERIZATION OF 7-OXANORBORNENE, IONOPHORES | CALIFORNIA INSTITUTE OF TECHNOLOGY (US) | 1990-07-31 | — | — | US | disclosed |
| US-4945141-A | Ring opening metathesis polymerization of strained cyclic ethers | CALIFORNIA INSTITUTE OF TECHNOLOGY (US) | 1990-07-31 | — | — | US | disclosed |
| US-4945135-A | IONOPHORES FROM 7-OXANORBORNENE DERIVATIVES | CALIFORNIA INSTITUTE OF TECHNOLOGY (US) | 1990-07-31 | — | — | US | disclosed |
| US-4883851-A | POLYMERS OF 7-OXANORBORENE | CALIFORNIA INSTITUTE OF TECHNOLOGY (US) | 1989-11-28 | — | — | US | disclosed |
| EP-0327745-A1 | Diels alder assisted polymer grafting process | THE DOW CHEMICAL COMPANY (US) | 1989-08-16 | — | — | EP | disclosed |
| US-4122076-A | Process of preparing maleimides | GENERAL ELECTRIC COMPANY (US) | 1978-10-24 | — | — | US | disclosed |
| US-4110294-A | POLYIMIDES | CIBA-GEIGY CORPORATION (US) | 1978-08-29 | — | — | US | disclosed |
| US-4055409-A | Pyrazole plant growth regulants | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1977-10-25 | — | — | US | disclosed |
| US-3969254-A | Chemical compounds | MONSANTO COMPANY (US) | 1976-07-13 | — | — | US | disclosed |
| US-3948937-A | Pyrazole plant growth regulants | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1976-04-06 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11474432-B2 | Chemically amplified photosensitive composition, photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and compound | CUTA, RAD51, PCNA | PPM1B 347/4885KMT2A 700/4885MEN1 418/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.