SCHEMBL23812256

SCHEMBL23812256

CC(C)(C)OC(=O)c1ccc(S(=O)(=O)O)cc1

nearest known ligand 0.66

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CA12 O43570 3/20 0.66
▸ CA1 P00915 3/20 0.66
▸ CA2 P00918 3/20 0.66
▸ CA9 Q16790 3/20 0.66
▸ CA14 Q9ULX7 3/20 0.66
▸ STAT3 P40763 2/20 0.47
▸ LMNA P02545 1/20 0.42
▸ TMPRSS6 Q8IU80 2/20 0.41
▸ F2 P00734 1/20 0.41
▸ TSHR P16473 2/20 0.41
▸ ALDH1A1 P00352 1/20 0.41
▸ NT5E P21589 1/20 0.41
▸ GLA P06280 1/20 0.41
▸ GABRA1 P14867 1/20 0.40
▸ GABRG2 P18507 1/20 0.40
▸ GABRB3 P28472 1/20 0.40
▸ GABRA3 P34903 1/20 0.40
▸ GABRA2 P47869 1/20 0.40
▸ ELANE P08246 2/20 0.40
▸ FBP1 P09467 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25007822 0.85 CA12 (0.66) CA12CA1CA2CA9CA14
SCHEMBL109451 0.84 CA1 (0.61) CA12CA1CA2CA9CA14
SCHEMBL3899241 0.84 CA12 (0.64) CA12CA1CA2CA9CA14
SCHEMBL948406 0.84 CA2 (0.90) CA12CA1CA2CA9CA14
SCHEMBL178361 0.81 LCK (0.52) CA12CA1CA2CA9CA14
SCHEMBL6858676 0.80 LCK (0.50) CA12CA1CA2CA9CA14
SCHEMBL6293232 0.80 LCK (0.50) CA12CA1CA2CA9CA14
Hydrazine SCHEMBL10771056 0.80 CA12 (0.62) CA12CA1CA2CA9CA14
SCHEMBL5322110 0.79 CA1 (0.62) CA12CA1CA2CA9CA14
SCHEMBL20531679 0.78 LMNA (0.50) CA12CA1CA2CA9CA14

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230280652-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING MONOMERIC COMPOUND JSR CORPORATION (JP) 2023-09-07 — — US disclosed
US-20230280652-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING MONOMERIC COMPOUND JSR CORPORATION (JP) 2023-09-07 — — US disclosed
US-11709428-B2 Radiation-sensitive resin composition, method for forming pattern, and method for producing monomeric compound JSR CORPORATION (JP) 2023-07-25 — — US disclosed
US-11709428-B2 Radiation-sensitive resin composition, method for forming pattern, and method for producing monomeric compound JSR CORPORATION (JP) 2023-07-25 — — US disclosed
US-20210284773-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING MONOMERIC COMPOUND JSR CORPORATION (JP) 2021-09-16 — — US disclosed
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