Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13520497 | 0.85 | — | — | |
| SCHEMBL14567551 | 0.85 | CYP2C19 (0.33) | CYP2D6CYP2C19 | |
| SCHEMBL13525789 | 0.80 | CYP2C19 (0.35) | CYP2D6CYP2C19 | |
| SCHEMBL13525991 | 0.79 | CYP2D6 (0.33) | CYP2D6CYP2C19 | |
| SCHEMBL13520499 | 0.79 | — | — | |
| SCHEMBL16894040 | 0.78 | CYP2D6 (0.34) | CYP2D6CYP2C19 | |
| SCHEMBL13744776 | 0.78 | HTT (0.32) | CYP2D6CYP2C19 | |
| SCHEMBL13744383 | 0.78 | ABHD6 (0.32) | — | |
| SCHEMBL23694120 | 0.78 | CYP2C19 (0.33) | CYP2D6CYP2C19 | |
| SCHEMBL75012 | 0.78 | CYP2C19 (0.33) | CYP2D6CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1415974-B1 | PROCESS FOR PRODUCTION OF FLUORINE-CONTAINING NORBORNENE DERIVATIVES | DAIKIN IND LTD (JP) | 2017-03-01 | — | — | EP | disclosed |
| EP-1762895-B1 | Antireflective Hard Mask Compositions | ROHM & HAAS ELECT MAT (US) | 2016-02-24 | — | — | EP | disclosed |
| US-8373241-B2 | Antireflective hard mask compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2013-02-12 | — | — | US | disclosed |
| US-8026037-B2 | Si-polymers and photoresists comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-09-27 | — | — | US | disclosed |
| US-8026037-B2 | Si-polymers and photoresists comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-09-27 | — | — | US | disclosed |
| US-20100297539-A1 | ANTIREFLECTIVE HARD MASK COMPOSITIONS | ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. (US) | 2010-11-25 | — | — | US | disclosed |
| US-7649118-B2 | Process for preparing fluorine-containing norbornene derivative | DAIKIN INDUSTRIES, LTD. (JP) | 2010-01-19 | — | — | US | disclosed |
| US-7649118-B2 | Process for preparing fluorine-containing norbornene derivative | DAIKIN INDUSTRIES, LTD. (JP) | 2010-01-19 | — | — | US | disclosed |
| US-7605439-B2 | Antireflective hard mask compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2009-10-20 | — | — | US | disclosed |
| US-20090136867-A1 | Si-polymers and photoresists comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2009-05-28 | — | — | US | disclosed |
| EP-1762895-A1 | Antireflective Hard Mask Compositions | Rohm and Haas Electronic Materials, L.L.C. (US) | 2007-03-14 | — | — | EP | disclosed |
| US-7186773-B2 | Process for preparing fluorine-containing norbornene derivative | DAIKIN INDUSTRIES, LTD. (JP) | 2007-03-06 | — | — | US | disclosed |
| US-7186773-B2 | Process for preparing fluorine-containing norbornene derivative | DAIKIN INDUSTRIES, LTD. (JP) | 2007-03-06 | — | — | US | disclosed |
| US-7108955-B2 | Polysiloxane, process for production thereof and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-09-19 | — | — | US | disclosed |
| US-20060058480-A1 | Polymerizable monomer polymeric compound resin compositions for photoresist and method for producing semiconductor | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-03-16 | — | — | US | disclosed |
| US-20050282985-A1 | FLUORINE-ATOM-CONTAINING POLYMERIZABLE UNSATURATED-MONOMER, FLUORINE-ATOM-CONTAINING POLYMERIC COMPOUND AND PHOTORESIST RESIN COMPOSITION | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2005-12-22 | — | — | US | disclosed |
| US-20040248032-A1 | Polymers and photoresists comprising same | ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. | 2004-12-09 | — | — | US | disclosed |
| EP-1455230-A2 | Polymers and photoresists comprising same | Rohm and Haas Electronic Materials, L.L.C. (US) | 2004-09-08 | — | — | EP | disclosed |
| US-20040143082-A1 | Polysiloxane, process for production thereof and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2004-07-22 | — | — | US | disclosed |
| EP-1398339-A1 | POLYSILOXANE, PROCESS FOR PRODUCTION THEREOF AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2004-03-17 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20050282985-A1 | FLUORINE-ATOM-CONTAINING POLYMERIZABLE UNSATURATED-MONOMER, FLUORINE-ATOM-CONTAINING POLYMERIC COMPOUND AND PHOTORESIST RESIN COMPOSITION | AFF1, AFF2, FPR1 | CYP2D6 3399/4885CYP2C19 2474/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.