SCHEMBL2384274

SCHEMBL2384274

C=C(CCOc1ccc(C2(c3ccc(OCCC(=C)C(=O)O)cc3)c3ccccc3-c3ccccc32)cc1)C(=O)O

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PDK2 Q15119 9/20 0.44
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
POLB P06746 1/20 0.40
KDM4E B2RXH2 1/20 0.40
LMNA P02545 1/20 0.40
MAPT P10636 1/20 0.40
OPRK1 P41145 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
MMP3 P08254 1/20 0.39
HDAC3 O15379 1/20 0.38
HDAC4 P56524 1/20 0.38
HDAC1 Q13547 1/20 0.38
HDAC7 Q8WUI4 1/20 0.38
HDAC2 Q92769 1/20 0.38
HDAC10 Q969S8 1/20 0.38
HDAC11 Q96DB2 1/20 0.38
HDAC8 Q9BY41 1/20 0.38
HDAC6 Q9UBN7 1/20 0.38
HDAC9 Q9UKV0 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3760944 0.83 PDK2 (0.41) PDK2MEN1KMT2APOLBKDM4E
Methacrylic Acid SCHEMBL31331565 0.82 GAA (0.46) PDK2MEN1KMT2APOLBKDM4E
Methacrylic Acid SCHEMBL23002863 0.82 GAA (0.46) PDK2MEN1KMT2APOLBKDM4E
SCHEMBL2422572 0.82 PDK2 (0.42) PDK2MEN1KMT2APOLBKDM4E
SCHEMBL534211 0.81 PDK2 (0.41) PDK2MEN1KMT2AKDM4ELMNA
SCHEMBL2416279 0.80 PDK2 (0.43) PDK2MEN1KMT2APOLBKDM4E
SCHEMBL44088 0.80 CYP1A2 (0.54) MEN1KMT2AKDM4ESMN1; SMN2MMP3
SCHEMBL12603569 0.80 PKM (0.44) PDK2MEN1KMT2APOLBKDM4E
SCHEMBL3873305 0.80 L3MBTL1 (0.53) LMNAMAPTMMP3HDAC3HDAC4
SCHEMBL17111003 0.78 PDK2 (0.43) PDK2MEN1KMT2APOLBKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105848897-B Biaxially stretched laminated polyester film 三菱化学株式会社 2020-01-10 CN disclosed
US-8022396-B2 Semiconductor device including an insulating layer resistant to a photolithography process, electronic device, and electronic equipment SEIKO EPSON CORPORATION (JP) 2011-09-20 US disclosed
US-20080233417-A1 OPTICAL POLYMER MATERIAL AND OPTICAL COMPONENT SANYO ELECTRIC CO., LTD. (JP) 2008-09-25 US disclosed
US-20080042130-A1 SEMICONDUCTOR DEVICE, ELECTRONIC DEVICE, AND ELECTRONIC EQUIPMENT SEIKO EPSON CORPORATION (JP) 2008-02-21 US disclosed