SCHEMBL23870697

SCHEMBL23870697

CCCCN(CCOC(=O)C(C)I)CCOC(=O)C(C)I

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRM2 P08172 3/20 0.41
LMNA P02545 2/20 0.41
CYP1A2 P05177 2/20 0.41
CYP2D6 P10635 2/20 0.41
CYP3A4 P08684 2/20 0.41
HTR1A P08908 1/20 0.41
GAA P10253 1/20 0.41
DRD3 P35462 1/20 0.41
SCN1A P35498 1/20 0.41
SLC6A3 Q01959 1/20 0.41
KCNH2 Q12809 1/20 0.41
SCN2A Q99250 1/20 0.41
SCN3A Q9NY46 1/20 0.41
ALDH1A1 P00352 3/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
DNM1 Q05193 1/20 0.38
CA12 O43570 2/20 0.37
CA1 P00915 2/20 0.37
CA9 Q16790 2/20 0.37
THRA P10827 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23870694 0.93 DNM1 (0.42) CHRM2LMNACYP1A2CYP2D6CYP3A4
SCHEMBL23867174 0.93 DNM1 (0.42) CHRM2LMNACYP1A2CYP2D6CYP3A4
SCHEMBL23867004 0.89 CYP2D6 (0.40) CHRM2LMNACYP1A2CYP2D6CYP3A4
SCHEMBL19731033 0.85 CHRM2 (0.43) CHRM2LMNACYP1A2CYP2D6CYP3A4
SCHEMBL23871230 0.85 CHRM2 (0.42) CHRM2LMNACYP1A2CYP2D6CYP3A4
SCHEMBL23870696 0.84 CYP1A2 (0.36) CHRM2LMNACYP1A2CYP2D6CYP3A4
SCHEMBL25142186 0.83 CYP2D6 (0.37) CHRM2LMNACYP1A2CYP2D6CYP3A4
SCHEMBL23870850 0.83 CYP2D6 (0.47) CHRM2LMNACYP1A2CYP2D6CYP3A4
SCHEMBL26784166 0.83 CYP2D6 (0.51) CHRM2LMNACYP1A2CYP2D6CYP3A4
SCHEMBL19847406 0.82 LMNA (0.41) CHRM2LMNACYP1A2CYP2D6CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 US disclosed
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 US disclosed
US-20210302837-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-09-30 US disclosed