SCHEMBL26784166

SCHEMBL26784166

CCN(CC)CCOC(=O)C(C)I

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 3/20 0.51
LMNA P02545 3/20 0.51
CYP1A2 P05177 2/20 0.51
CYP3A4 P08684 2/20 0.50
ALDH1A1 P00352 1/20 0.50
SMN1; SMN2 Q16637 1/20 0.50
SCN5A Q14524 1/20 0.44
SCN9A Q15858 1/20 0.44
SCN10A Q9Y5Y9 1/20 0.44
TSHR P16473 2/20 0.44
MAOA P21397 1/20 0.44
HTR3A P46098 1/20 0.44
HRH3 Q9Y5N1 1/20 0.44
BLM P54132 1/20 0.42
NPSR1 Q6W5P4 1/20 0.42
CHRM2 P08172 6/20 0.41
CHRM1 P11229 5/20 0.41
CHRM3 P20309 4/20 0.41
CHRM4 P08173 2/20 0.41
SCN1A P35498 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23870850 0.96 CYP2D6 (0.47) CYP2D6LMNACYP1A2CYP3A4ALDH1A1
SCHEMBL23867004 0.90 CYP2D6 (0.40) CYP2D6LMNACYP1A2CYP3A4ALDH1A1
SCHEMBL25142186 0.84 CYP2D6 (0.37) CYP2D6LMNACYP1A2CYP3A4ALDH1A1
SCHEMBL12216017 0.83 CYP2D6 (0.54) CYP2D6LMNACYP1A2CYP3A4ALDH1A1
SCHEMBL23870697 0.83 CHRM2 (0.41) CYP2D6LMNACYP1A2CYP3A4ALDH1A1
SCHEMBL26082932 0.82 LMNA (0.36) CYP2D6LMNACYP1A2CYP3A4ALDH1A1
SCHEMBL23870871 0.82 CHRNB2 (0.38) CYP2D6LMNACYP1A2CYP3A4ALDH1A1
SCHEMBL11208221 0.82 CYP2D6 (0.53) CYP2D6LMNACYP1A2CYP3A4ALDH1A1
SCHEMBL23870694 0.80 DNM1 (0.42) CYP2D6LMNACYP1A2CYP3A4ALDH1A1
SCHEMBL12192504 0.80 CYP2D6 (0.51) CYP2D6LMNACYP1A2CYP3A4ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 US disclosed
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 US disclosed