SCHEMBL25142186

SCHEMBL25142186

CC(C)C(=O)OCCN(CCOC(=O)C(C)C)CCOC(=O)C(C)I

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2D6 P10635 3/20 0.37
LMNA P02545 2/20 0.37
CYP1A2 P05177 2/20 0.37
CYP3A4 P08684 2/20 0.36
ALDH1A1 P00352 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
CHRM2 P08172 3/20 0.32
CHRM1 P11229 3/20 0.32
CHRM3 P20309 2/20 0.32
CHRM4 P08173 1/20 0.32
CHRM5 P08912 1/20 0.32
CHRNB2 P17787 1/20 0.32
CHRNA4 P43681 1/20 0.32
SCN5A Q14524 1/20 0.32
SCN9A Q15858 1/20 0.32
SCN10A Q9Y5Y9 1/20 0.32
TSHR P16473 2/20 0.30
MAOA P21397 1/20 0.30
HTR3A P46098 1/20 0.30
HRH3 Q9Y5N1 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23867004 0.94 CYP2D6 (0.40) CYP2D6LMNACYP1A2CYP3A4ALDH1A1
SCHEMBL62958 0.89 CYP2D6 (0.42) CYP2D6LMNACYP1A2CYP3A4ALDH1A1
SCHEMBL24142624 0.89 KDM4E (0.40) CYP2D6LMNACYP1A2CYP3A4ALDH1A1
SCHEMBL23870871 0.86 CHRNB2 (0.38) CYP2D6LMNACYP1A2CYP3A4ALDH1A1
SCHEMBL24246399 0.85 ALDH1A1 (0.30) ALDH1A1TSHR
SCHEMBL26784166 0.84 CYP2D6 (0.51) CYP2D6LMNACYP1A2CYP3A4ALDH1A1
SCHEMBL23870850 0.84 CYP2D6 (0.47) CYP2D6LMNACYP1A2CYP3A4ALDH1A1
SCHEMBL23870697 0.83 CHRM2 (0.41) CYP2D6LMNACYP1A2CYP3A4ALDH1A1
SCHEMBL26784393 0.82 HSD17B10 (0.44) CYP2D6LMNACYP1A2CYP3A4ALDH1A1
SCHEMBL23870696 0.82 CYP1A2 (0.36) CYP2D6LMNACYP1A2CYP3A4ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230120132-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-20 US disclosed