SCHEMBL25142153

SCHEMBL25142153

CC(I)C(=O)OC1(c2ccc(Cl)cc2)CCNCC1

nearest known ligand 0.45

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
DRD2 P14416 2/20 0.45
CCR2 P41597 1/20 0.37
AKT1 P31749 1/20 0.36
AKT2 P31751 1/20 0.36
AKT3 Q9Y243 1/20 0.36
SLC6A4 P31645 3/20 0.35
SLC6A3 Q01959 3/20 0.35
SLC6A2 P23975 2/20 0.35
OPRM1 P35372 2/20 0.35
MMP1 P03956 1/20 0.34
MMP9 P14780 1/20 0.34
MMP13 P45452 1/20 0.34
ADAM17 P78536 1/20 0.34
DRD4 P21917 1/20 0.34
DRD3 P35462 1/20 0.34
ATM Q13315 1/20 0.33
GAA P10253 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25142150 0.88 OPRM1 (0.35) DRD2SLC6A3OPRM1
SCHEMBL26784777 0.86 MME (0.35) OPRM1MMP9
SCHEMBL25475408 0.86 DRD2 (0.45) DRD2CCR2AKT1AKT2AKT3
SCHEMBL23870808 0.86 OPRM1 (0.35) DRD2AKT1OPRM1DRD4DRD3
SCHEMBL23870803 0.86 OPRM1 (0.48) OPRM1DRD3
SCHEMBL26785479 0.83 DRD2 (0.47) DRD2CCR2AKT1AKT2AKT3
SCHEMBL23870812 0.83 MMP2 (0.38) SLC6A4SLC6A3SLC6A2OPRM1MMP9
SCHEMBL23870804 0.82 OPRM1 (0.44) OPRM1
SCHEMBL23870810 0.80 SLC6A2 (0.44) CCR2SLC6A4SLC6A3SLC6A2OPRM1
SCHEMBL23870806 0.78 OPRM1 (0.43) SLC6A4SLC6A3SLC6A2OPRM1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 US disclosed
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 US disclosed
US-20230120132-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-20 US disclosed