SCHEMBL23870929

SCHEMBL23870929

CC(I)C(=O)OCCC1CCCCN1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FDPS P14324 2/20 0.43
SLC6A3 Q01959 5/20 0.39
KMT2A Q03164 3/20 0.39
SLC6A2 P23975 3/20 0.39
SLC6A4 P31645 3/20 0.39
CYP2D6 P10635 2/20 0.39
MEN1 O00255 2/20 0.39
LMNA P02545 2/20 0.39
TP53 P04637 2/20 0.39
ALDH1A1 P00352 1/20 0.39
CYP1A2 P05177 1/20 0.39
TSHR P16473 1/20 0.39
MLNR O43193 1/20 0.39
ABCB11 O95342 1/20 0.39
EGFR P00533 1/20 0.39
FYN P06241 1/20 0.39
CHRM2 P08172 1/20 0.39
CHRM4 P08173 1/20 0.39
HTR1A P08908 1/20 0.39
CHRM5 P08912 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26785171 0.81 FDPS (0.45) FDPSSLC6A3KMT2ASLC6A2SLC6A4
SCHEMBL6050108 0.81 FDPS (0.44) FDPSSLC6A3KMT2ASLC6A2SLC6A4
SCHEMBL9345089 0.80 FDPS (0.46) FDPSSLC6A3KMT2ASLC6A2SLC6A4
Hydrochloric Acid SCHEMBL7423281 0.80 FDPS (0.42) FDPSSLC6A3KMT2ASLC6A2SLC6A4
SCHEMBL23871120 0.78 FDPS (0.39) FDPSSLC6A3KMT2ASLC6A2SLC6A4
SCHEMBL28091183 0.78 FDPS (0.44) FDPSSLC6A3KMT2ASLC6A2SLC6A4
SCHEMBL13295367 0.77 CHRNB2 (0.41) FDPSSLC6A3KMT2ASLC6A2SLC6A4
SCHEMBL27638711 0.77 FDPS (0.41) FDPSSLC6A3KMT2ASLC6A2SLC6A4
SCHEMBL27774215 0.77 FDPS (0.41) FDPSSLC6A3KMT2ASLC6A2SLC6A4
SCHEMBL29028812 0.75 THRB (0.39) FDPSSLC6A3KMT2ASLC6A2SLC6A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 US disclosed
US-11822245-B2 Resist composition and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-21 US disclosed
US-20210302837-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-09-30 US disclosed