SCHEMBL2398717

SCHEMBL2398717

CCC(C)(C)[Si](Oc1ccccc1)(Oc1ccccc1)Oc1ccccc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 5/20 0.41
RIPK1 Q13546 1/20 0.39
TSHR P16473 1/20 0.39
L3MBTL1 Q9Y468 3/20 0.37
NPSR1 Q6W5P4 1/20 0.37
CA4 P22748 1/20 0.36
CHRNB2 P17787 2/20 0.33
CHRNB4 P30926 2/20 0.33
CHRNA3 P32297 2/20 0.33
CHRNA7 P36544 2/20 0.33
CHRNA4 P43681 2/20 0.33
NPC1 O15118 1/20 0.33
POLB P06746 1/20 0.33
CYP2C9 P11712 1/20 0.33
RAB9A P51151 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
KCNA3 P22001 1/20 0.33
PPARA Q07869 1/20 0.33
LMNA P02545 1/20 0.33
HTT P42858 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL426731 0.78 CA4 (0.42) LTA4HRIPK1TSHRL3MBTL1CA4
SCHEMBL19816700 0.76 LTA4H (0.38) LTA4HRIPK1TSHRL3MBTL1CA4
SCHEMBL977952 0.75 KCNA3 (0.46) LTA4HTSHRL3MBTL1CA4CHRNB2
SCHEMBL19816783 0.72 CA4 (0.42) LTA4HRIPK1TSHRL3MBTL1CA4
SCHEMBL8903228 0.72 CA4 (0.37) LTA4HRIPK1TSHRL3MBTL1CA4
SCHEMBL702274 0.72 CA4 (0.37) LTA4HRIPK1TSHRCA4KCNA3
SCHEMBL19816779 0.72 LTA4H (0.35) LTA4HRIPK1CA4
SCHEMBL16061102 0.71 LTA4H (0.35) LTA4HRIPK1L3MBTL1NPSR1CA4
SCHEMBL429409 0.70 CA4 (0.43) LTA4HRIPK1TSHRL3MBTL1CA4
SCHEMBL19816724 0.69 LTA4H (0.39) LTA4HRIPK1TSHRL3MBTL1CA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8734906-B2 Films and method of production thereof BRISMAT INC. (US) 2014-05-27 US disclosed
US-8283260-B2 Process for restoring dielectric properties AIR PRODUCTS AND CHEMICALS, INC. (US) 2012-10-09 US disclosed
US-20110223329-A1 Films and method of production thereof UNIVERSITY OF QUEENSLAND (AU) 2011-09-15 US disclosed
US-20100041234-A1 Process For Restoring Dielectric Properties AIR PRODUCTS AND CHEMICALS, INC. (US) 2010-02-18 US disclosed
US-20090298671-A1 Compositions for Preparing Low Dielectric Materials Containing Solvents AIR PRODUCTS AND CHEMICALS, INC. (US) 2009-12-03 US disclosed
US-7500397-B2 Activated chemical process for enhancing material properties of dielectric films AIR PRODUCTS AND CHEMICALS, INC. (US) 2009-03-10 US disclosed
US-7482676-B2 Compositions for preparing low dielectric materials AIR PRODUCTS AND CHEMICALS, INC. (US) 2009-01-27 US disclosed
EP-1832351-B1 Low dielectric materials and methods for making same AIR PROD & CHEM (US) 2008-11-12 EP disclosed
US-20080264672-A1 Photoimprintable Low Dielectric Constant Material and Method for Making and Using Same AIR PRODUCTS AND CHEMICALS, INC. (US) 2008-10-30 US disclosed
US-20080199977-A1 Activated Chemical Process for Enhancing Material Properties of Dielectric Films AIR PRODUCTS AND CHEMICALS, INC. (US) 2008-08-21 US disclosed
US-20060183055-A1 Method for defining a feature on a substrate VERSUM MATERIALS US, LLC 2006-08-17 US disclosed
EP-1691410-A2 Method for defining a feature on a substrate Air Products and Chemicals, Inc. (US) 2006-08-16 EP disclosed
US-20050260420-A1 Low dielectric materials and methods for making same VERSUM MATERIALS US, LLC 2005-11-24 US disclosed
EP-1583141-A2 Solvents and methods using same for removing silicon-containing residues from a substrate AIR PRODUCTS AND CHEMICALS, INC. (US) 2005-10-05 EP disclosed
EP-1577935-A2 Compositions for preparing low dielectric materials containing solvents AIR PRODUCTS AND CHEMICALS, INC. (US) 2005-09-21 EP disclosed
US-20050196974-A1 Compositions for preparing low dielectric materials containing solvents VERSUM MATERIALS US, LLC 2005-09-08 US disclosed
US-20050196535-A1 Solvents and methods using same for removing silicon-containing residues from a substrate AIR PRODUCTS AND CHEMICALS, INC. 2005-09-08 US disclosed
EP-1464410-A1 Low dielectric materials and methods for making same AIR PRODUCTS AND CHEMICALS, INC. (US) 2004-10-06 EP disclosed
US-20040048960-A1 Compositions for preparing low dielectric materials AIR PRODUCTS AND CHEMICALS, INC. 2004-03-11 US disclosed
EP-1376671-A1 Compositions for preparing materials with a low dielectric constant AIR PRODUCTS AND CHEMICALS, INC. (US) 2004-01-02 EP disclosed