Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.37 |
| ▸ | CA2 | P00918 | 1/20 | 0.37 |
| ▸ | NFE2L2 | Q16236 | 2/20 | 0.37 |
| ▸ | POLB | P06746 | 2/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.34 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.34 |
| ▸ | RELA | Q04206 | 1/20 | 0.34 |
| ▸ | HPGD | P15428 | 2/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | NR1H4 | Q96RI1 | 2/20 | 0.33 |
| ▸ | GLA | P06280 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.33 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28251566 | 0.86 | KDM4E (0.40) | POLBKMT2AKDM4EALDH1A1HSD17B10 | |
| SCHEMBL2949035 | 0.84 | LMNA (0.44) | CA1CA2NFE2L2POLBKMT2A | |
| SCHEMBL347774 | 0.83 | CYP3A4 (0.40) | KMT2AKDM4EALDH1A1HSD17B10HPGD | |
| SCHEMBL1905156 | 0.82 | KDM4E (0.41) | KMT2AKDM4EALDH1A1HPGDLMNA | |
| SCHEMBL5614479 | 0.81 | ALDH1A1 (0.38) | CA1CA2POLBKDM4EALDH1A1 | |
| SCHEMBL27656832 | 0.81 | MAPT (0.33) | CA1CA2KMT2AKDM4EALDH1A1 | |
| SCHEMBL5468604 | 0.80 | ALDH1A1 (0.44) | CA1CA2NFE2L2KMT2AKDM4E | |
| SCHEMBL31410748 | 0.80 | ALDH1A1 (0.44) | POLBKMT2AKDM4EALDH1A1HSD17B10 | |
| SCHEMBL31410740 | 0.79 | KDM4E (0.40) | POLBKMT2AKDM4EALDH1A1HSD17B10 | |
| SCHEMBL15110860 | 0.78 | KMT2A (0.54) | POLBKMT2AKDM4EALDH1A1HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107229185-A | The manufacture method of energy sensitivities composition, solidfied material and solidfied material | 东京应化工业株式会社 | 2017-10-03 | — | — | CN | disclosed |
| CN-105541659-A | Halogenated oxime derivatives and their use as potential acid | CIBA SPECIALTY CHEMICALS HOLDING INC | 2016-05-04 | — | — | CN | disclosed |
| CN-102781911-B | Latent acids and their use | BASF SE | 2015-07-22 | — | — | CN | disclosed |
| CN-102186815-B | Sulfonium derivatives and the use therof as latent acids | BASF SE | 2014-07-30 | — | — | CN | disclosed |
| CN-101522613-B | Sulphonium salt photoinitiators | CIBA HOLDING INC | 2013-03-06 | — | — | CN | disclosed |
| EP-2539316-A1 | LATENT ACIDS AND THEIR USE | BASF SE (DE) | 2013-01-02 | — | — | EP | disclosed |
| CN-102781911-A | Latent acids and their use | BASF SE | 2012-11-14 | — | — | CN | disclosed |
| CN-102186815-A | Sulfonium derivatives and the use therof as latent acids | BASF SE | 2011-09-14 | — | — | CN | disclosed |
| WO-2011104127-A1 | LATENT ACIDS AND THEIR USE | BASF SE (DE) | 2011-09-01 | — | — | WO | disclosed |
| CN-101522613-A | Sulphonium salt photoinitiators | CIBA SC HOLDING AG (CH) | 2009-09-02 | — | — | CN | disclosed |
| CN-101466804-A | Sulfonium salt initiators | CIBA HOLDING INC (CH) | 2009-06-24 | — | — | CN | disclosed |
| CN-100338056-C | Substituted oxime derivatives and their use as latent acids | LIBA SPECIALTY CHEMICALS HOLDI (CH) | 2007-09-19 | — | — | CN | disclosed |
| CN-1751269-A | Halogenated oxime derivatives and their use as latent acids | CIBA SC HOLDING AG (CH) | 2006-03-22 | — | — | CN | disclosed |
| CN-1512990-A | Substituted oxime derivatives and their use as latent acids | �������⻯ѧƷ�ع�����˾ | 2004-07-14 | — | — | CN | disclosed |
| CN-1145078-C | Polymer and resist material | ������ҩ��ҵ��ʽ���� | 2004-04-07 | — | — | CN | disclosed |
| US-6013411-A | PHOTOSENSITIVE COMPOSITION WITH HOMO OR COPOLYCARBONS, HALOGENIUM COMPOUNDS AND SULFONIUM COMPOUNDS | FUJI PHOTO FILM CO., LTD. (JP) | 2000-01-11 | — | — | US | disclosed |
| CN-1159453-A | Polymer and resist material | WAKO PURE CHEM IND LTD (JP) | 1997-09-17 | — | — | CN | disclosed |