SCHEMBL347774

SCHEMBL347774

C=Cc1ccccc1C(=O)OC(C)(C)C

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.40
ALDH1A1 P00352 4/20 0.39
KDM4E B2RXH2 1/20 0.39
GLA P06280 1/20 0.39
GAA P10253 1/20 0.39
MAPT P10636 1/20 0.39
THRB P10828 1/20 0.39
HPGD P15428 1/20 0.39
HIF1A Q16665 1/20 0.39
ADRA1A P35348 1/20 0.39
ADRA1B P35368 1/20 0.39
MEN1 O00255 1/20 0.36
NPC1 O15118 1/20 0.36
HTT P42858 1/20 0.36
RAB9A P51151 1/20 0.36
KMT2A Q03164 1/20 0.36
TSHR P16473 4/20 0.36
HSD17B10 Q99714 2/20 0.36
TDP1 Q9NUW8 1/20 0.36
GRM6 O15303 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1905156 0.85 KDM4E (0.41) CYP3A4ALDH1A1KDM4EGLAGAA
SCHEMBL1899484 0.85 CYP3A4 (0.37) CYP3A4ALDH1A1KDM4EMAPTTSHR
SCHEMBL97166 0.84 MEN1 (0.41) ALDH1A1THRBHPGDADRA1AADRA1B
SCHEMBL5614479 0.84 ALDH1A1 (0.38) CYP3A4ALDH1A1KDM4EGLAGAA
SCHEMBL27656832 0.84 MAPT (0.33) CYP3A4ALDH1A1KDM4EGLAGAA
SCHEMBL28555504 0.84 CYP2C19 (0.41) CYP3A4ALDH1A1MAPTHIF1AMEN1
SCHEMBL2409607 0.83 CA1 (0.37) ALDH1A1KDM4EGLAGAAMAPT
SCHEMBL8565728 0.83 ADRA1A (0.39) CYP3A4ALDH1A1ADRA1AADRA1BMEN1
SCHEMBL3807002 0.82 MEN1 (0.34) CYP3A4ALDH1A1KDM4EGLAGAA
SCHEMBL1898887 0.82 TSHR (0.40) CYP3A4ALDH1A1KDM4EMAPTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 520 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119591759-A KrF photoresist film-forming resin and preparation method and application thereof 北京光舟科技有限公司 2025-03-11 CN claimed
CN-118732392-A Photoresist composition and preparation method thereof 万华化学集团股份有限公司 2024-10-01 CN claimed
CN-116594268-A Method for improving adhesiveness and/or developing speed of photoresist 华中科技大学 2023-08-15 CN claimed
US-9260572-B2 CNT-polymer complex capable of self-doping by external stimuli and process for preparing the same KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2016-02-16 US claimed
US-20160017103-A1 CNT-POLYMER COMPLEX CAPABLE OF SELF-DOPING BY EXTERNAL STIMULI AND PROCESS FOR PREPARING THE SAME KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2016-01-21 US claimed
US-7759402-B2 Use of grafted polyethersiloxane copolymers for improving the low-temperature stability of antifoams in aqueous dispersions EVONIK GOLDSCHMIDT GMBH (DE) 2010-07-20 US claimed
US-20090093598-A1 Use of Grafted Polyethersiloxane Copolymers for Improving the Low-Temperature Stability of Antifoams in Aqueous Dispersions GOLDSCHMIDT GMBH (DE) 2009-04-09 US claimed
EP-1894962-B1 Use of grafted polyether siloxane mixed polymers to improve the stability at low temperatures of defoamers in aqueous solutions EVONIK GOLDSCHMIDT GMBH (DE) 2008-12-17 EP claimed
US-20080160449-A1 Photoresist polymer having nano-smoothness and etching resistance, and resist composition LION CORPORATION (JP) 2008-07-03 US claimed
CN-1974623-A Grafted polyether copolymers and their use as stablizers in polyurethane foams GOLDSCHMIDT GMBH (DE) 2007-06-06 CN claimed
CN-1626058-A Permanent deformation of hair comprises applying a reducing composition containing sufficient metal and/or ammonium ions to precipitate an anionic or amphoteric polymer in situ OREAL (FR) 2005-06-15 CN claimed
EP-1434091-A1 CHEMICAL-AMPLIFICATION-TYPE POSITIVE RADIATION-SENSITIVE RESIN COMPOSITION Clariant International Ltd. (CH) 2004-06-30 EP claimed
US-20040033438-A1 Chemical-amplication-type positive radiation-sensitive resin composition AZ ELECTRONIC MATERIALS USA CORP. 2004-02-19 US claimed
EP-0102450-B1 RESIST COMPOSITIONS International Business Machines Corporation (US) 1991-09-04 EP claimed
US-4491628-A TERT-BUTYL ESTERS OR CARBONATES INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1985-01-01 US claimed
EP-0102450-A2 Resist compositions International Business Machines Corporation (US) 1984-03-14 EP claimed
US-12535735-B2 Modified thioxanthone photoinitiators LINTFIELD LIMITED (GB) 2026-01-27 US disclosed
US-20250362597-A1 RESIST COMPOSITION AND RESIST FILM FORMING METHOD USING SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2025-11-27 US disclosed
EP-0264908-A2 High sensitivity resists having autodecomposition temperatures greater than about 160 C International Business Machines Corporation (US) 1988-04-27 EP disclosed
EP-0252233-A1 Process for improving the adhesion of non-polar photoresists to polar substrates International Business Machines Corporation (US) 1988-01-13 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12535735-B2 Modified thioxanthone photoinitiators FTO, UGT1A6, TPMT CYP3A4 350/4885ALDH1A1 135/4885KDM4E 155/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.