SCHEMBL24110725

SCHEMBL24110725

COc1cc(OC(=O)OC(C)(C)C)c(C)c(OC(=O)OC(C)(C)C)c1O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ LMNA P02545 1/20 0.40
▸ CYP3A4 P08684 3/20 0.40
▸ POLB P06746 2/20 0.39
▸ MEN1 O00255 1/20 0.39
▸ MAPT P10636 1/20 0.39
▸ HPGD P15428 1/20 0.39
▸ GFER P55789 1/20 0.39
▸ KMT2A Q03164 1/20 0.39
▸ NPSR1 Q6W5P4 1/20 0.39
▸ TDP1 Q9NUW8 1/20 0.39
▸ PKM P14618 2/20 0.37
▸ CA12 O43570 1/20 0.37
▸ CA1 P00915 1/20 0.37
▸ CA2 P00918 1/20 0.37
▸ CA3 P07451 1/20 0.37
▸ CA4 P22748 1/20 0.37
▸ CA6 P23280 1/20 0.37
▸ CA5A P35218 1/20 0.37
▸ CA7 P43166 1/20 0.37
▸ CA9 Q16790 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24110721 0.84 MTNR1A (0.39) LMNACYP3A4PKMCA12CA1
SCHEMBL16785682 0.82 CYP3A4 (0.38) CYP3A4POLBMEN1MAPTHPGD
SCHEMBL16785679 0.82 CYP3A4 (0.38) CYP3A4POLBMEN1MAPTHPGD
SCHEMBL16785680 0.80 ELANE (0.39) LMNACYP3A4MEN1MAPTHPGD
SCHEMBL16785671 0.77 ELANE (0.42) LMNAPOLBMAPTTDP1ELANE
SCHEMBL16785677 0.76 ACHE (0.48) LMNAPOLBMEN1MAPTKMT2A
SCHEMBL16785673 0.75 TNFSF11 (0.42) CYP3A4MEN1KMT2AELANEMTNR1A
SCHEMBL17410782 0.75 MTNR1A (0.47) CYP3A4CA1CA2CA4CA6
SCHEMBL16785675 0.75 TNFSF11 (0.42) CYP3A4MEN1KMT2AELANEMTNR1A
SCHEMBL16785672 0.74 ACHE (0.55) LMNACYP3A4MEN1MAPTHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11815813-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-14 — — US disclosed
US-20210389672-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-12-16 — — US disclosed
Send feedback