SCHEMBL24110735

SCHEMBL24110735

COc1cc(OC(=O)OC(C)(C)C)c(I)cc1C=O

nearest known ligand 0.47

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 6/20 0.47
▸ KDM4E B2RXH2 2/20 0.47
▸ TSHR P16473 1/20 0.47
▸ TDP1 Q9NUW8 1/20 0.47
▸ MTNR1A P48039 4/20 0.41
▸ MTNR1B P49286 4/20 0.41
▸ MAPT P10636 1/20 0.38
▸ LMNA P02545 1/20 0.37
▸ HPGD P15428 1/20 0.37
▸ NFE2L2 Q16236 1/20 0.36
▸ MCL1 Q07820 1/20 0.35
▸ GAA P10253 1/20 0.35
▸ SMN1; SMN2 Q16637 1/20 0.35
▸ ERN1 O75460 3/20 0.35
▸ ELANE P08246 1/20 0.35
▸ L3MBTL1 Q9Y468 1/20 0.35
▸ PRKDC P78527 1/20 0.34
▸ HCRTR1 O43613 1/20 0.34
▸ HCRTR2 O43614 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24110777 0.88 MTNR1A (0.40) ALDH1A1KDM4ETSHRTDP1MTNR1A
SCHEMBL24110722 0.81 MTNR1A (0.44) ALDH1A1KDM4ETSHRMTNR1AMTNR1B
SCHEMBL24110535 0.81 ALDH1A1 (0.55) ALDH1A1KDM4ETSHRTDP1MAPT
SCHEMBL2816217 0.78 ALDH1A1 (0.69) ALDH1A1KDM4ETSHRTDP1MAPT
SCHEMBL30664485 0.77 ALDH1A1 (0.61) ALDH1A1KDM4ETSHRTDP1MAPT
SCHEMBL24106128 0.77 MTNR1A (0.40) TSHRMTNR1AMTNR1BLMNAGAA
SCHEMBL16072688 0.76 ALDH1A1 (0.51) ALDH1A1KDM4ETDP1MAPTLMNA
SCHEMBL24110736 0.76 MTNR1A (0.40) ALDH1A1KDM4ETSHRTDP1MTNR1A
SCHEMBL24110776 0.76 MTNR1A (0.48) ALDH1A1KDM4EMTNR1AMTNR1BGAA
SCHEMBL24110579 0.76 MCL1 (0.43) ALDH1A1MTNR1AMTNR1BMCL1ERN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11815813-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-14 — — US disclosed
US-11815813-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-14 — — US disclosed
US-20210389672-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-12-16 — — US disclosed
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