SCHEMBL24110579

SCHEMBL24110579

COc1c(I)cc(C=O)c(OC(=O)OC(C)(C)C)c1C

nearest known ligand 0.43

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
▸ MCL1 Q07820 1/20 0.43
▸ MTNR1A P48039 1/20 0.34
▸ MTNR1B P49286 1/20 0.34
▸ ELANE P08246 1/20 0.33
▸ HCRTR1 O43613 1/20 0.33
▸ HCRTR2 O43614 1/20 0.33
▸ TPMT P51580 1/20 0.33
▸ ERN1 O75460 3/20 0.31
▸ CA1 P00915 1/20 0.31
▸ CA2 P00918 1/20 0.31
▸ SRC P12931 1/20 0.31
▸ ALDH1A1 P00352 1/20 0.30
▸ CYP1A2 P05177 1/20 0.30
▸ CYP2C19 P33261 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24110726 0.82 MCL1 (0.48) MCL1HCRTR1HCRTR2TPMTERN1
SCHEMBL24110752 0.76 MTNR1A (0.34) MCL1MTNR1AMTNR1BELANETPMT
SCHEMBL27426725 0.76 ELANE (0.39) MCL1MTNR1AMTNR1BELANECA2
SCHEMBL24110735 0.76 ALDH1A1 (0.47) MCL1MTNR1AMTNR1BELANEHCRTR1
SCHEMBL24110750 0.76 ELANE (0.32) ELANE
SCHEMBL27426726 0.75 ALDH1A1 (0.40) MTNR1AMTNR1BALDH1A1
SCHEMBL27255619 0.74 ELANE (0.42) MTNR1AMTNR1BELANETPMTCA2
SCHEMBL16785683 0.73 ELANE (0.41) ELANE
SCHEMBL16785684 0.73 ELANE (0.41) ELANE
SCHEMBL24110758 0.72 TPMT (0.45) MTNR1AMTNR1BELANETPMTCA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11815813-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-14 — — US disclosed
US-11815813-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-14 — — US disclosed
US-20210389672-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-12-16 — — US disclosed
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