Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TPMT | P51580 | 5/20 | 0.45 |
| ▸ | MTNR1A | P48039 | 1/20 | 0.37 |
| ▸ | MTNR1B | P49286 | 1/20 | 0.37 |
| ▸ | ELANE | P08246 | 1/20 | 0.36 |
| ▸ | DRD2 | P14416 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | CA2 | P00918 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24110752 | 0.81 | MTNR1A (0.34) | TPMTMTNR1AMTNR1BELANE | |
| SCHEMBL24110760 | 0.80 | TPMT (0.51) | TPMTDRD2TDP1 | |
| SCHEMBL24110666 | 0.79 | MTNR1A (0.41) | TPMTMTNR1AMTNR1BELANE | |
| SCHEMBL27280348 | 0.76 | ELANE (0.43) | TPMTMTNR1AMTNR1BELANECA2 | |
| SCHEMBL24110722 | 0.75 | MTNR1A (0.44) | TPMTMTNR1AMTNR1BELANE | |
| SCHEMBL27255619 | 0.74 | ELANE (0.42) | TPMTMTNR1AMTNR1BELANECA2 | |
| SCHEMBL24110721 | 0.72 | MTNR1A (0.39) | MTNR1AMTNR1BELANECA2 | |
| SCHEMBL24110579 | 0.72 | MCL1 (0.43) | TPMTMTNR1AMTNR1BELANECA2 | |
| SCHEMBL24110746 | 0.72 | ELANE (0.34) | MTNR1AMTNR1BELANE | |
| SCHEMBL27255623 | 0.71 | ELANE (0.39) | MTNR1AMTNR1BELANECA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11815813-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-14 | — | — | US | disclosed |
| US-11815813-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-14 | — | — | US | disclosed |
| US-20210389672-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-12-16 | — | — | US | disclosed |