Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RECQL | P46063 | 2/20 | 1.00 |
| ▸ | HSD11B1 | P28845 | 8/20 | 0.87 |
| ▸ | LMNA | P02545 | 1/20 | 0.68 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.66 |
| ▸ | PKM | P14618 | 2/20 | 0.66 |
| ▸ | MAPT | P10636 | 1/20 | 0.65 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.60 |
| ▸ | MEN1 | O00255 | 2/20 | 0.60 |
| ▸ | NPC1 | O15118 | 2/20 | 0.60 |
| ▸ | RAB9A | P51151 | 2/20 | 0.60 |
| ▸ | TP53 | P04637 | 1/20 | 0.60 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.60 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29609963 | 0.98 | RECQL (0.97) | RECQLHSD11B1LMNAALDH1A1PKM | |
| SCHEMBL10872654 | 0.95 | RECQL (0.91) | RECQLHSD11B1LMNAALDH1A1PKM | |
| SCHEMBL6202982 | 0.93 | HSD11B1 (1.00) | RECQLHSD11B1LMNAALDH1A1PKM | |
| SCHEMBL29012562 | 0.91 | HSD11B1 (0.83) | RECQLHSD11B1LMNAALDH1A1PKM | |
| SCHEMBL30209482 | 0.91 | HSD11B1 (0.82) | RECQLHSD11B1LMNAALDH1A1PKM | |
| SCHEMBL452973 | 0.87 | HSD11B1 (0.77) | RECQLHSD11B1ALDH1A1MAPTKMT2A | |
| SCHEMBL30209483 | 0.87 | HSD11B1 (0.76) | RECQLHSD11B1LMNAALDH1A1PKM | |
| SCHEMBL29609513 | 0.85 | HSD11B1 (0.74) | RECQLHSD11B1ALDH1A1MAPTKMT2A | |
| SCHEMBL4966036 | 0.84 | RECQL (0.73) | RECQLHSD11B1LMNAALDH1A1MAPT | |
| SCHEMBL28392708 | 0.84 | RECQL (0.73) | RECQLHSD11B1ALDH1A1KMT2AMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-4287041-A | — | — | None | — | — | JP | disclosed |
| CN-119731596-A | Photosensitive resin composition, photosensitive resin sheet, cured product, method for producing cured product, semiconductor device, display device, and method for producing resin | 东丽株式会社 | 2025-03-28 | — | — | CN | disclosed |
| US-20240199854-A1 | COMPOSITION, CURED FILM, STRUCTURAL BODY, OPTICAL FILTER, SOLID-STATE IMAGING ELEMENT, IMAGE DISPLAY DEVICE, AND MANUFACTURING METHOD OF CURED FILM | FUJIFLIM CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| WO-2024070845-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN SHEET, CURED PRODUCT, CURED PRODUCT PRODUCTION METHOD, SEMICONDUCTOR DEVICE, DISPLAY DEVICE, AND RESIN PRODUCTION METHOD | 東レ株式会社 | 2024-04-04 | — | — | WO | disclosed |
| WO-2024057999-A1 | COLORING COMPOSITION, CURED FILM, COLOR FILTER, DISPLAY DEVICE AND METHOD FOR PRODUCING CURED FILM | 富士フイルム株式会社 | 2024-03-21 | — | — | WO | disclosed |
| WO-2023248887-A1 | POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE TYPE PHOTOSENSITIVE RESIN SHEET, CURED PRODUCT, CURED PRODUCT MANUFACTURING METHOD, SEMICONDUCTOR DEVICE, AND DISPLAY DEVICE | 東レ株式会社 | 2023-12-28 | — | — | WO | disclosed |
| CN-116217395-A | Preparation method of beta-carbonyl compound | 黄淮学院 | 2023-06-06 | — | — | CN | disclosed |
| WO-2023032746-A1 | COMPOSITION, CURED FILM, STRUCTURE, OPTICAL FILTER, SOLID-STATE IMAGING ELEMENT, IMAGE DISPLAY DEVICE, AND METHOD FOR PRODUCING CURED FILM | 富士フイルム株式会社 | 2023-03-09 | — | — | WO | disclosed |
| CN-110095941-B | Photosensitive resin composition and method for producing semiconductor element | 东丽株式会社 | 2023-02-17 | — | — | CN | disclosed |
| CN-111978216-B | Preparation method of beta-carbonyl sulfone compound | 西南医科大学 | 2023-02-03 | — | — | CN | disclosed |
| US-20050272036-A1 | Ketones | ASTRAZENECA AB (SE) | 2005-12-08 | — | — | US | disclosed |
| EP-0497342-B1 | Negative photoresist composition | SUMITOMO CHEMICAL CO (JP) | 1998-08-05 | — | — | EP | disclosed |
| US-5719001-A | IMPROVED CHARGING, DISCOLORATION INHIBITION, IMAGE QUALITY | EASTMAN KODAK COMPANY (US) | 1998-02-17 | — | — | US | disclosed |
| US-5520725-A | Dental glass ionomer cement composition | GC CORPORATION (JP) | 1996-05-28 | — | — | US | disclosed |
| US-5304456-A | Negative photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1994-04-19 | — | — | US | disclosed |
| JP-H04287041-A | CHEMICAL AMPLIFICATION TYPE RESIST COMPOSITION AND PATTERNING METHOD | FUJITSU LTD | 1992-10-12 | — | — | JP | disclosed |
| EP-0497342-A2 | Negative photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1992-08-05 | — | — | EP | disclosed |
| US-5026740-A | For transparent or pigmented mixtures | FRATELLI LAMBERTI S.P.A. (IT) | 1991-06-25 | — | — | US | disclosed |
| EP-0432495-A1 | Stabilized halogen-containing resin composition | KYOWA CHEMICAL INDUSTRY CO., LTD. (JP) | 1991-06-19 | — | — | EP | disclosed |
| EP-0192967-B1 | SULPHURATED DERIVATIVES OF AROMATIC-ALIPHATIC AND ALIPHATIC KETONES AS POLYMERISATION PHOTOINITIATORS | FRATELLI LAMBERTI S.p.A. (IT) | 1990-08-01 | — | — | EP | disclosed |