SCHEMBL24254714

SCHEMBL24254714

Fc1c(F)c(F)c(-c2cc(-c3cc(-c4cc(C(F)(F)F)cc(C(F)(F)F)c4)cc(-c4cc(C(F)(F)F)cc(C(F)(F)F)c4)c3)cc(-c3c(F)c(F)c(F)c(F)c3F)c2)c(F)c1F

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RXRA P19793 5/20 0.41
RXRB P28702 5/20 0.41
RXRG P48443 4/20 0.41
IKBKB O14920 1/20 0.41
CNR1 P21554 2/20 0.38
CNR2 P34972 2/20 0.38
CES2 O00748 1/20 0.37
TDP1 Q9NUW8 1/20 0.36
IDO1 P14902 2/20 0.33
GABRP O00591 1/20 0.32
GABRD O14764 1/20 0.32
GABRA1 P14867 1/20 0.32
GABRB1 P18505 1/20 0.32
GABRG2 P18507 1/20 0.32
GABRB3 P28472 1/20 0.32
GABRA5 P31644 1/20 0.32
GABRA3 P34903 1/20 0.32
GABRA2 P47869 1/20 0.32
GABRB2 P47870 1/20 0.32
GABRA4 P48169 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17555046 0.95 IKBKB (0.43) RXRARXRBRXRGIKBKBCNR1
SCHEMBL13866628 0.83 RXRA (0.52) RXRARXRBRXRGIKBKBCNR1
SCHEMBL17570537 0.81 NOTUM (0.44) RXRARXRBRXRGIKBKBCNR1
SCHEMBL9482063 0.80 RXRA (0.54) RXRARXRBRXRGIKBKBCNR1
SCHEMBL17711112 0.78 CTSS (0.37) RXRARXRBRXRGIKBKBCNR1
SCHEMBL17563224 0.77 CHRNB2 (0.30)
SCHEMBL21766567 0.77 IKBKB (0.35) IKBKBSLC1A3SLC1A2SLC1A1AKR1C3
SCHEMBL26375581 0.77 NOTUM (0.41) RXRARXRBRXRGIKBKB
SCHEMBL24906885 0.77 IDO1 (0.35) RXRARXRBRXRGIKBKBIDO1
SCHEMBL23045002 0.76 NOTUM (0.46) RXRARXRBRXRGIKBKBCNR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4198163-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN Tosoh Corporation (JP) 2023-06-21 EP disclosed
WO-2022034907-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2022-02-17 WO disclosed