SCHEMBL24254765

SCHEMBL24254765

Fc1c(F)c(F)c(-c2c(F)c(F)c(-c3cc(-c4c(F)c(F)c(-c5c(F)c(F)c(F)c(F)c5F)c(F)c4F)c(-c4cccc5ccccc45)cc3-c3cccc4ccccc34)c(F)c2F)c(F)c1F

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKR1C3 P42330 1/20 0.39
AKR1C2 P52895 1/20 0.39
GPR84 Q9NQS5 1/20 0.39
KDM4E B2RXH2 1/20 0.39
ALPL P05186 1/20 0.39
GAA P10253 1/20 0.39
ALDH1A1 P00352 4/20 0.36
HSD17B10 Q99714 4/20 0.36
TSHR P16473 3/20 0.36
HIF1A Q16665 3/20 0.36
HPGD P15428 2/20 0.36
MAPK1 P28482 2/20 0.36
CASP1 P29466 2/20 0.36
TP53 P04637 1/20 0.36
CASP7 P55210 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
HPRT1 P00492 1/20 0.36
DHFR P00374 1/20 0.36
PTPN1 P18031 1/20 0.35
CES1 P23141 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4138564 0.86 DHFR (0.44) KDM4EALPLGAAALDH1A1HSD17B10
SCHEMBL26750936 0.84 DHFR (0.43) AKR1C3AKR1C2GPR84KDM4EALPL
SCHEMBL26750829 0.81 DHFR (0.41) KDM4EALPLGAAALDH1A1HSD17B10
SCHEMBL29892469 0.80 ALDH1A1 (0.48) AKR1C3AKR1C2KDM4EALPLGAA
SCHEMBL28112434 0.77 HPRT1 (0.42) AKR1C3AKR1C2GPR84KDM4EALPL
SCHEMBL18174178 0.77 ALDH1A1 (0.56) KDM4EALPLGAAALDH1A1HSD17B10
SCHEMBL28232171 0.76 DHFR (0.47) AKR1C3AKR1C2KDM4EALPLGAA
SCHEMBL30567006 0.75 KDM4E (0.48) GPR84KDM4EALPLGAAALDH1A1
SCHEMBL311416 0.75 KDM4E (0.48) GPR84KDM4EALPLGAAALDH1A1
SCHEMBL29350007 0.74 ALDH1A1 (0.59) KDM4EALPLGAAALDH1A1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4198163-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN Tosoh Corporation (JP) 2023-06-21 EP disclosed
WO-2022034907-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2022-02-17 WO disclosed