SCHEMBL24254767

SCHEMBL24254767

Cc1cc(-c2c3c(F)c(F)c(F)c(F)c3c(-c3cc(C(F)(F)F)cc(C(F)(F)F)c3)c3c(F)c(F)c(F)c(F)c23)cc(C(F)(F)F)c1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IKBKB O14920 1/20 0.41
NOTUM Q6P988 1/20 0.41
RAPGEF4 Q8WZA2 2/20 0.39
PGK1 P00558 1/20 0.34
PGK2 P07205 1/20 0.34
RXRA P19793 4/20 0.34
RXRB P28702 4/20 0.34
CNR1 P21554 1/20 0.33
CNR2 P34972 1/20 0.33
RXRG P48443 2/20 0.32
MAPT P10636 1/20 0.32
TDP1 Q9NUW8 1/20 0.31
GABRP O00591 1/20 0.31
GABRD O14764 1/20 0.31
GABRA1 P14867 1/20 0.31
GABRB1 P18505 1/20 0.31
GABRG2 P18507 1/20 0.31
GABRB3 P28472 1/20 0.31
GABRA5 P31644 1/20 0.31
GABRA3 P34903 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17570537 0.87 NOTUM (0.44) IKBKBNOTUMRAPGEF4PGK1PGK2
SCHEMBL26375464 0.80 NOTUM (0.50) IKBKBNOTUMRAPGEF4PGK1PGK2
SCHEMBL26375581 0.79 NOTUM (0.41) IKBKBNOTUMRAPGEF4PGK1PGK2
SCHEMBL13949153 0.78 NOTUM (0.49) IKBKBNOTUMRAPGEF4PGK1PGK2
SCHEMBL26375583 0.77 NOTUM (0.43) IKBKBNOTUMRAPGEF4TDP1GABRP
SCHEMBL12583263 0.76 RAPGEF4 (0.48) IKBKBNOTUMRAPGEF4PGK1PGK2
SCHEMBL17555046 0.76 IKBKB (0.43) IKBKBRXRARXRBCNR1CNR2
SCHEMBL12583213 0.76 NOTUM (0.50) IKBKBNOTUMRAPGEF4PGK1PGK2
SCHEMBL26401075 0.76 NOTUM (0.52) IKBKBNOTUMRAPGEF4PGK1PGK2
SCHEMBL26568307 0.76 IKBKB (0.37) IKBKBNOTUMRAPGEF4PGK1PGK2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2022034907-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2022-02-17 WO disclosed